Canon Kabushiki Kaisha

Akio Hasebe

Tsutomu Murakami

Hirofumi Ichinose

Satoshi Shinkura

Yukie Ueno

Masaya Hisamatsu

Ippei Sawayama

Tatsuo Fujisaki

Yoshifumi Takeyama

Takeshi Takada

Koji Tsuzuki

Nobuo Tokutake

In a method of irradiating an object with simulated solar radiation using a plurality of light sources, the object is irradiated with simulated solar radiation resulting from superimposed light rays from a plurality of light sources including light sources having different times at which light emission output reaches a peak.

Method and apparatus for irradiating simulated solar radiation

Photovoltaic element and method for producing the same

An electrode structure is formed by superposing a bar-shaped or linear metal member on an electroconductive layer comprising a polymeric resin and an electroconductive filler dispersed therein. The electroconductive layer may be formed as an electroconductive sheet in advance and patterned before it is superposed with the metal member, followed by heat and pressure application to provide an electrode structure showing a low resistivity, a large adhesion even to an elevation and a high reliability. The electrode structure is suitably used for providing a collector electrode structure on a photo-electricity generating device.

Electrode structure, process production thereof and photo-electricity

An etching apparatus is described comprising a substrate holding segment for holding a substrate with a portion to be etched, an electrolytic bath for maintaining an electrolyte solution therein, a locomotive mechanism for moving the substrate holding segment in order to immerse the substrate held on the substrate holding segment in the electrolyte solution maintained in the electrolytic bath, and a counter electrode holding segment for holding a counter electrode having a pattern corresponding a desired etching pattern to be formed at the portion to be etched of the substrate. The counter electrode is positioned to oppose the substrate held on the substrate holding segment.

Etching apparatus

A photovoltaic device is provided which comprises a semiconductor layer, and an electrode comprising an electrode member and an conductive resin layer, wherein the electrode member has a constitution of a complex of a core and a periphery, and the periphery contains no particle with a particle size larger than 2 .mu.m. The electrode of this photovoltaic device exhibits high current collecting efficiency and is reliable in long use term.

Photovoltaic device

An electrode structure is constituted by a first electrode, and at least one second electrode providing a pair of opposite portions with a prescribed spacing therebetween at which the first electrode is disposed. The electrode structure is suitably used for electrolytic etching and is effective in providing an accurate etching pattern without damaging the surface of an etching object.

Electrode structure, electrolytic etching process and apparatus

A photovoltaic device is provided which comprises at least one metal wire on a surface of a photovoltaic element for collecting the power generated by the photovoltaic element, the at least one metal wire being coated with an electroconductive adhesive over the entire length and fixed onto the photovoltaic element. The photovoltaic device is produced without applying and curing the electroconductive adhesive in the photovoltaic device production process at low cost with high reliability.

Photovoltaic element electrode structure thereof and process for

A method for etching an object having a portion to be etched on the surface thereof, comprising a step of immersing said object in an electrolyte solution such that said object serves as a negative electrode; a step of arranging a counter electrode having a pattern corresponding to a desired etching pattern to be formed at said portion to be etched of said object in said electrolyte solution so as to maintain a predetermined interval between said counter electrode and said object, and a step of applying a direct current or a pulse current between said object and said counter electrode to etch said portion to be etched of said object into a pattern corresponding to said pattern of said counter electrode.

Etching method and process for producing a semiconductor element using

A photovoltaic element comprising an electrode comprising an electrically conductive core member which is coated with a conductive adhesive fixed on the light incident surface of a photoactive semiconductor layer, via the conductive adhesive, is disclosed. The conductive adhesive is composed of at least two layers. The softening point of the conductive adhesive layer nearer to the core member is higher than the highest temperature encountered in the manufacture of the photovoltaic element.

Method for producing photovoltaic element

A process for producing a photovoltaic element, said process comprising the steps of: providing a photovoltaic element comprising a lower electrode layer comprising a metallic layer comprising aluminum or an aluminum compound and a transparent and electrically conductive layer, a photoelectric conversion semiconductor layer, and a transparent electrode layer stacked in the named order on an electrically conductive surface of a substrate, and immersing said photovoltaic element in an electrolyte solution to passivate an short-circuited current path defect present in said photovoltaic element by the action of an electric field, wherein said electrolyte solution has a chlorine ion content of 0.03 mol/l or less.

Process for the production of a photovoltaic element

A photovoltaic device comprising a semiconductor layer, a current collecting electrode on said semiconductor layer, and a bus bar electrically connected to the current collecting electrode. The current collecting electrode comprises a metal wire. A part of the current collecting electrode is positioned between the bus bar and the semiconductor layer.

Photovoltaic cell and method of making the same

A method of etching material as a transparent conductive film, a method of producing a semiconductor device, and an etchant therefor are disclosed. These method and etchant are simple, excellent in etching selectivity, and stable for a long time. The methods include the steps of disposing paste on material wherein the paste includes an etching solution and at least one kind of fine particles. A method of producing a semiconductor device, including the above-described etching steps is also disclosed.

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Nagahama, Japan

Akio Hasebe