Shin-etsu Chemical Co., Ltd.

Akinori Nishimura

Toru Shirasaki

Yuichi Hamada

The present invention provides a pellicle frame, a pellicle, an exposure original plate with the pellicle, an exposure method, and a semiconductor or liquid-crystal-display manufacturing method, the pellicle frame constituting a pellicle for photolithography.

Pellicle frame, pellicle, exposure original plate with pellicle, exposure method, and semiconductor or liquid-crystal-display manufacturing method

Provided is an agglutinant for pellicles that can reduce residues stuck onto an exposure original plate when a pellicle is peeled from the exposure original plate after being used in lithography, and also provided are a pellicle, an exposure original plate with a pellicle, a method for regenerating an exposure original plate, and a peeling residue reduction method.

Agglutinant for pellicle, pellicle, exposure original plate with pellicle, method for producing semiconductor device, method for producing liquid crystal display board, method for regenerating exposure original plate, and peeling residue reduction method

The present invention is to provide a pellicle characterized by including a pellicle film and a pellicle frame, in which the pellicle film is stretched on the pellicle frame, and the pellicle film is an annealed pellicle film, and to provide a method for producing a pellicle by stretching a pellicle film on a pellicle frame, including the step of annealing the pellicle film alone before stretching the pellicle film on the pellicle frame, annealing the pellicle after stretching the pellicle film on the pellicle frame, or annealing the pellicle film alone and the pellicle both before and after stretching the pellicle film on the pellicle frame.

Pellicle and method for producing the same

There is provided a pellicle frame and a pellicle using the frame, which has a hollow space inside a corner portion of the frame and optionally one or more hollow spaces in a straight portion (bar) of the frame, and also a hollow space in a corner portion of the frame may communicate with a neighboring hollow space in a straight portion of the frame.

Pellicle frame and a pellicle using the same

There is provided a pellicle for EUV lithography, which has a filter attached to a vent hole made through a pellicle frame bar for air pressure adjustment, and this filter is designed to be heat-resistant by being made of either a metal or a ceramic material, and is adhered to the pellicle frame by weldering or soldering, and also the filter has a filtration accuracy of 0.1 through 0.3 &#x3bc;m.

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Annaka, Japan

Akinori Nishimura