Mitsui Minings & Melting Co., Ltd.

Akinori Kumagai

Masaaki Inamura

Jun-ichi Itoh

Asuka Sasakura

Haruka Shimizu

Masayuki Matsuyama

Mikimasa Horiuchi

Takayoshi Mori

Riichi Ogawara

Michiyo Inoue

Syuhei Hara

Ken Matsuo

Jun-Ichi Itoh

Provided is a novel tantalate dispersion containing no hardly-volatile organic component and having high dispersibility in water, the tantalate dispersion containing tantalum or/and tantalate and amine in water, the tantalate dispersion having an intensity ratio (5.5°/29°) of an intensity at 2θ=5.5° to an intensity at 2θ=29° being 1.00 or more in an X-ray diffraction pattern obtained by subjecting a powder obtained by drying the tantalate dispersion to powder X-ray diffraction measurement using CuKα rays.

Tantalate dispersion and tantalate compound

A polishing liquid is provided containing manganese oxide abrasive grains, permanganate ions, and a cellulosic surfactant or a cationic surfactant. The polishing liquid has a pH of 5 or more and 11 or less. The cellulosic surfactant is preferably a carboxymethyl cellulose or a derivative thereof. The cationic surfactant preferably has a quaternary ammonium ion site. The content of the cellulosic surfactant or the cationic surfactant is preferably 0.01 mass % or more and 1.0 mass % or less based on the total amount of the polishing liquid.

Polishing liquid and polishing method

A polishing slurry according to the present invention contains: abrasive grains made of a metal oxide; a permanganate; and an inorganic compound other than the permanganate. The inorganic compound is such that a solution that is obtained by adding the inorganic compound to a 1.0 mass % aqueous solution of the permanganate so that the inorganic compound accounts for 1.0 mass % of the resultant aqueous solution has an oxidation-reduction potential higher than that of the 1.0 mass % aqueous solution of the permanganate. It is preferable that the inorganic compound be contained in an amount of 0.7 parts by mass or more and 150 parts by mass or less relative to 100 parts by mass of the permanganate. It is also preferable that the abrasive grains made of a metal oxide be manganese oxide particles.

Polishing slurry and polishing material

Provided is a novel CaS-based phosphor with which chemical reactions can be inhibited even if said CaS-based phosphor is heated with a heterogeneous material. This phosphor includes: a crystalline parent material represented by the composition formula CaSrS.yZnO (in the formula, 0&#x2266;x&#x3c;1, 0&#x3c;y&#x2266;0.5); and a luminescent center.

Phosphor, LED light-emission element, and light source device

Provided is a novel coated phosphor capable of effectively suppressing the adverse effects of hydrogen sulfide gas generated by the reaction between a sulfur-containing phosphor and moisture in the air. Provided is a sulfur-containing phosphor having a configuration in which ZnO compound containing Zn and O is present on the surface of a sulfur-containing phosphor having a host material which includes sulfur.

Sulfur-containing phosphor coated with ZnO compound

A highly reliable light-emitting device is provided, which is capable of effectively suppressing detrimental effects of sulfuric gas. A light-emitting device comprising a solid light-emitting element, a metal memberreacting with sulfuric gas and a phosphor-containing layerthat contains a phosphor, the phosphor-containing layercontaining a sulfuric gas-adsorbing substancethat adsorbs sulfuric gas, and, when the phosphor-containing layeris tripartitioned from the side near the metal member to far into a proximal layer portion, an intermediate layer portion and an outer layer portion, the concentration of sulfuric gas-adsorbing substancein the proximal layer portion is made to be higher than those for the intermediate layer portion and the outer layer portion.

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Ageo, Japan

Akinori Kumagai