Kokusai Electric Co., Ltd.

Other

Akinobu Yamaoka

Hitoshi Oka

Fumio Morita

Masataka Fujiki

Susumu Aiuchi

Yoichi Takahara

Tomonori Saeki

Yuichirou Tanaka

Noriyuki Ohroku

At a time of cleaning a plate-like part such as a wafer or the like while rotating, for the purpose of reducing a contamination, a damage and an unevenness of process of the plate-like part which are caused by an amount of charged electricity of the plate-like part, chuck pins (chuck members) which chuck the plate-like part such as the wafer or the like and upper and lower cleaning plates and which oppose to the plate-like part are constituted by a resin material containing carbon powders, and a desired potential difference is applied to a portion between the plate-like part and the cleaning plates by a voltage control unit which is provided in an outer portion.

Cleaning apparatus for plate-like part and method thereof

To carry out very clean and low-cost fluid processing on both the front and rear surfaces of an object to be processed without generating rubbing particles and without leakage of fluid. A retention member for the object to be processed that retains the object to be processed and a rear shielding plate that prevents the rear surface of the object to be processed from becoming contaminated by excessive fluid flow are mechanically separated. The rear shielding plate is fixed in like manner to a front shielding plate , only the retention member for the object to be processed is allowed to rotate making it possible to rigidly connect a supply pipe (that supplies fluid through the rear shielding plate ) to the rear shielding plate . Further, a circulation system is provided that collects fluid which underwent front surface processing in a collection tube , circulates that fluid and then supplies it to the rear surface of the object to be processed from a supply pipe.

Fluid processing apparatus

A clean, recirculating and processing method which prevents surface contamination of an object, such as a semiconductor, semi-conductor wafer, glass for LCD or magnetic disk is provided which includes covering the front and rear surfaces of an object to be processed with front and rear shielding plates and allows the object to rotate relative to the front and rear shielding plates. The fluid is supplied between the front surface of the object and the front shielding plate allowing the front surface to be processed. The remaining fluid is collected and recirculated between the rear surface of the object and the rear shielding plate allowing the rear surface of the object to be processed. An apparatus for accomplishing the method is also disclosed.

Clean, recirculating processing method which prevents surface contamination of an object

Growing community of inventors

Toyama-ken, Japan

Akinobu Yamaoka