Hitachi, Ltd.

Hitachi-High-Technologies Corporation

Hitachi-Science Systems, Ltd.

Akimitsu Okura

Yoshihiko Nakayama

Masashi Kimura

Yasushi Nakaizumi

Kenichi Hirane

Hideo Todokoro

Mitsugu Sato

Tadashi Otaka

Eiichi Hazaki

Osamu Yamada

Toshiaki Kobari

Hiroshi Iwamoto

Tsutomu Komoda

Osamu Satou

Motohide Ukiana

Syobu Saito

Issei Tobita

Yasuhiko Ishida

Hideiti Kimura

Minoru Hiroki

Disclosed is an electron beam apparatus and method which can retain the state that minimizes the amount of water content contained at a gap between a high-voltage cable and a high-voltage introduction insulator to thereby prevent creation of high-voltage discharge and current leakage. The apparatus comprises a means for applying a high voltage to an acceleration electrode while eliminating electron release from an electron source and for detecting a change in an emission current corresponding to a change in an acceleration voltage at this time. In addition, the apparatus comprises a means for issuing a cautionary notice or warning when the change of this emission current exceeds a prespecified value. Further, the apparatus comprises a means for letting a dry gas flow in a gap portion between the electron gun's high-voltage cable and the high-voltage introduction insulator to thereby dehumidify said gap portion. With such an arrangement, it is possible to prevent high-voltage discharge due to an increase in water content of the gap portion and also instability of an electron beam due to a leakage current.

Electron beam apparatus and high-voltage discharge prevention method

A vacuum container is evacuated to be kept at an ultra-high vacuum. Valve means is provided for connecting and disconnecting the inside of the vacuum container with and from the outside thereof, and includes a vacuum-tight seal made of a high polymer having a water absorptivity of 0.1% and less and an outgassing rate of 2.times.10.sup.-6 (Torr.multidot.l/sec/cm.sup.2 :at 200.degree. C.) and less.

Ultra-high vacuum apparatus

An electron beam apparatus comprises an electron beam source, a unit for irradiating an electron beam on a specimen, a detector for secondary electrons, an electrode for generating an electric field sufficient to draw out secondary electrons in a recess in the specimen from the recess, and a unit for generating a magnetic field for focusing secondary electrons drawn out of the recess. With this construction, the secondary electrons drawn out of the recess by the electric field reach the detector without being attracted by the electrode. By adopting this construction, a contact hole of high aspect ratio formed in a semiconductor device and having a small diameter and a large depth can be observed.

Electron beam apparatus

A specimen is scanned with an electron beam so as to generate a signal characteristic of the specimen to thereby produce an image thereof on the basis of the generated signal. A memory is provided for storing operating conditions of a scanning electron microscope which are associated with identification information for specifying the specimen. The identification information is designated so that thereby at least one operating condition corresponding to the designated identification information is read out from the memory, and the read out operating condition is automatically set so that the scanning electron microscope is operated under the set operating condition.

Charged particle beam apparatus and it's operating method

A specimen holder holding a frozen specimen is adapted to engage the opened end of a recess in a specimen support, such that the frozen specimen is exposed to the inside of the recess. The mutually engaging specimen holder and the specimen support are shifted to a specimen chamber. In the specimen chamber, the specimen holder is separated from the specimen support and is received by a specimen receiving chamber. The specimen holder received by the specimen receiving member can be moved together with the latter to a specimen treating chamber. Cooling means for cooling the specimen receiving member is unitarily secured to the specimen receiving member, so as to be moved together with the specimen receiving member.

Device for shifting frozen specimen, for use in scanning type electron

Growing community of inventors

Katsuta, Japan

Akimitsu Okura