Sony Corporation

Akiko Tsutsui

Hideo Kawabe

Ryo Koshiishi

Nobuhiko Mukai

A defect repair apparatus includes a defect detection unit, a database, a defect repair unit, and a control unit. The defect detection unit inspects a multilayer substrate on which a repetitive pattern is formed and extracts positional information on a defect in the repetitive pattern and feature information on the defect. In the database, a plurality of defect repair techniques are registered. The defect repair unit repairs the defect of the multilayer substrate by a defect repair technique specified. The control unit reads a defect repair technique for the defect detected by the defect detection unit and controls the defect repair unit that repairs the defect by using the defect repair technique.

Defect repair apparatus and defect repair method

A method of manufacturing a substrate formed with a plurality of wiring patterns on a base, includes: a first inspection step of identifying a faulty wiring pattern having electric short circuit or disconnection by performing an electric inspection respectively for the plurality of wiring patterns; a second inspection step of examining a relative position of a defect on the base and at least one of a type and a size of the defect by an optical inspection; a matching step of matching a result of the first inspection step with a result of the second inspection step, and identifying a critical defect having electric short circuit or disconnection; and a third inspection step of examining a relative position in a pixel and an effective range of the critical defect by an optical inspection.

Growing community of inventors

Kanagawa, Japan

Akiko Tsutsui