Canon Kabushiki Kaisha

Akiko Iimura

Toshiki Ito

Noriyasu Hasegawa

Tetsuya Yamamoto

Takashi Yoshida

Masahiro Kuri

Hitoshi Sato

Keiji Yamashita

Youji Kawasaki

Keiko Chiba

Shinya Takagi

Taiko Motoi

Yoshimasa Araki

Jun Kato

Shiori Yonezawa

Takeshi Honma

Hisashi Namba

Rie Ueno

Kazumi Iwashita

Takehiko Ueno

Sari Ito

A liquid discharge apparatus including a head configured to discharge a liquid, a chamber configured to contain the head, a circulation system configured to circulate a gas inside the chamber, an exhaust system configured to operate to exhaust the gas to an outside of the chamber, a filter provided in the circulation system and configured to remove a removal target contained in the gas, a detection unit configured to indirectly detect the removal target by detecting a detection target that is contained in the gas and different from the removal target, and a controller configured to operate the exhaust system when a concentration of the detection target detected by the detection unit is not lower than a threshold.

Liquid discharge apparatus, substrate processing apparatus and article manufacturing method

A liquid discharge device includes a container configured to contain a liquid; a discharge port which is formed by bonding a plurality of substrates and from which the liquid supplied from the container is discharged; a piezoelectric element provided in correspondence with the discharge port, and configured to generate energy for discharging the liquid from the discharge port; and a detection unit configured to detect peeling of a bonding surface between the plurality of substrates forming the discharge port.

Liquid discharge device and imprint apparatus

An ejection device includes: an ejection unit provided with an ejection port configured to eject an ejection material; a piezoelectric element configured to cause the ejection material to be ejected from the ejection unit; a first liquid chamber connected to the ejection unit and configured to supply the ejection unit with the ejection material; a pressure control unit configured to control a pressure in the ejection unit by controlling a pressure in the first liquid chamber; and a detection unit configured to detect a wetness of an ejection port side surface.

Ejection device, imprint apparatus, and detection method

A liquid ejection device, a cleaning apparatus and a cleaning method for a module substrate, which can remove foreign matter on an ejection opening face and in a flow path connected with an ejection opening is provided. For that purpose, an ejection opening face is covered with liquid, cleaning is performed by driving a device configured to vibrate liquid, and after that the liquid is collected.

Liquid ejection device, cleaning apparatus and cleaning method for module substrate

Method of forming a pattern by arranging a photocurable composition on a substrate; bringing a mold having a concavo-convex pattern into contact with the composition; irradiating the composition with light to form a cured film; releasing the mold from the cured film; forming a reversal layer on the cured film having a concavo-convex pattern transferred from the mold; partially removing the reversal layer to expose the convexes of the pattern in such a manner that the reversal layer remains in the concaves of the pattern formed on the cured film; and etching the photocurable composition layer using the reversal layer remaining in the concaves as a mask to form a reversal pattern, wherein the mold is brought into contact with the photocurable composition in an atmosphere of a soluble gas having a solubility in the composition; and the soluble gas has a saturation solubility of 38% by volume or more.

Method of forming pattern on a substrate

An imprint apparatus forms a pattern by curing a radical polymerizable imprint material by irradiating the imprint material with light in a state in which a mold is brought into contact with the imprint material. The apparatus includes an irradiator configured to irradiate the imprint material with light, and a controller configured to control the irradiator. Letting Ibe an illuminance of the light with which the imprint material is irradiated, tbe a time during which the imprint material is irradiated with the light, k be a coefficient, and PD be a target degree of photopolymerization of the imprint material subjected to irradiation with the light, the controller determines the irradiation time in accordance with: PD=k&#xd7;(&#x221a;I)&#xd7;t.

Imprint apparatus and article manufacturing method

A pattern is formed on a substrate with a layer of a curable composition (A1) containing a component (a1) serving as a polymerizable compound on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing at least a component (a2) serving as a polymerizable compound and a component (b2) serving as a photopolymerization initiator dropwise discretely onto the curable composition (A1) layer to lay the droplets, subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold having a pattern and the substrate, then irradiating the mixture layer with light to cure the layer, and releasing the mold from the mixture layer after the curing, a Distance in Hansen space Ra((a1)&#x2212;(A2)) between the component (a1) serving as a polymerizable compound in the curable composition (A1) and the curable composition (A2) being 6 or less.

Pattern forming method

The present invention relates to a photocurable composition for imprint in a condensable gas atmosphere. The composition at least includes a polymerizable compound component (A) and photopolymerization initiator component (B) and satisfies the Requirement (1):

Photocurable composition for imprint, method of producing cured film, method of producing optical component, method of producing circuit board, and method of producing electronic component

An imprint method includes: placing a light-curable composition on a workpiece substrate (placement); bringing the light-curable composition and a mold into contact with each other an atmosphere of a condensable gas (contact); aligning the mold and the workpiece substrate (alignment); irradiating the light-curable composition with light to obtain a light-cured composition (irradiation); and separating the light-cured composition and the mold from each other after the irradiation (release). The film thickness of the light-curable composition during the alignment is 20% or more greater than that of the light-cured composition after the release.

Imprint method and apparatus

In an imprint process in a gaseous atmosphere containing a condensable gas, the curable composition for photoimprint is difficult to cure, the pattern is not fully formed to cause defects. The present invention relates to a curable composition for photoimprint in a gaseous atmosphere containing a condensable gas. The curable composition for photoimprint at least comprises the following component (A) and component (B): Component (B) has a saturated solubility of less than 1% by weight in the condensable gas in a liquid state at 5&#xb0; C. and 1 atm or has a Hansen distance (Ra) of larger than 7.6 to the condensable gas.

Curable composition for photoimprint, cured product, and method of producing film having pattern, optical component, circuit board, or electronic component using the composition

Provided is a method for manufacturing a photo cured material, by which transferring precision can be improved and a small surface roughness can be obtained. The method includes the steps of: placing a photo-curable composition on a substrate; brining a mold into contact with the photo-curable composition; irradiating the photo-curable composition with light; and releasing the mold from the photo-curable composition. The contact is performed in a condensable gas atmosphere, the condensable gas condensing under a temperature condition at the contact and under a pressure condition that the condensable gas receives when the photo-curable composition intrudes gaps between the substrate and the mold or concavities provided on the mold, and the photo-curable composition includes a gas dissolution inhibitor having a rate of weight change with reference to the condensable gas that is &#x2212;1.0% to 3.0%.

Method for manufacturing photo cured material

An imprinting method for forming a pattern of a cured product by irradiating a curable composition for imprinting disposed on a substrate with light while the curable composition is in contact with a mold having surface asperities and removing the mold from a cured product of the curable composition. The method includes bringing the mold into contact with the curable composition in a condensable gas atmosphere, wherein the curable composition for imprinting has a viscosity in the range of 1 cP to 40 cP in air at 23&#xb0; C., and the condensable gas is introduced between the mold and the curable composition such that the curable composition for imprinting has a condensable gas solubility (gas/(curable composition+gas)) (g/g) in the range of 0.1 to 0.4.

Imprinting method and curable composition for imprinting

In a dispersion for electrophoretic display, used in an electrophoretic display device having i) charged electrophoretic particles and ii) a dispersion medium in which the charged electrophoretic particles stand dispersed, the dispersion medium contains at least one of an ethylene acrylate copolymer and a styrene copolymer. The styrene copolymer is in a content of from 0.0001 part by weight to 3 parts by weight based on 100 parts by weight of the dispersion medium.

Dispersion for electrophoretic display, and electrophoretic display device

Electrophoretic displaying particles are provided. The particle is comprised of a resin and pigment granules enclosed therein. The pigment granules have an average particle size ranging from 0.1 &#x3bc;m to 20 &#x3bc;m, and the granule diameter distribution has two or more frequency maximums. This electrophoretic displaying particulate has high masking performance, improving the displaying contrast of the displaying device.

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Utsunomiya, Japan

Akiko Iimura