Fujifilm Corporation

Akiko Hattori

Yuichiro Enomoto

Hirotaka Kitagawa

Ken Kawata

Akihiko Ohtsu

Atsushi Tatsugawa

Takayuki Ito

Kunihiko Kodama

Hiroshi Kawakami

Shinji Tarutani

Hiroki Sugiura

Takafumi Hosokawa

Akihito Amao

Tadashi Oomatsu

Masayuki Harada

Hiyoku Nakata

Katsuhiro Nishimaki

A method of cultivating a fruit vegetable plant, including raising seedlings of the fruit vegetable plant by a flooded hydroponic method using a culture solution having a dissolved oxygen concentration of 3.2 mg/l or more in an environment in which one or more conditions selected from the group consisting of temperature, relative humidity, and light are controlled.

Method of cultivating fruit vegetable plant

An object of the invention is to provide a conductive film having excellent visibility. Another object of the invention is to provide a touch panel sensor and a touch panel. A conductive film according to the embodiment of the invention includes a substrate and a conductive portion which is disposed on the substrate and composed of thin metal wires having a line width of 0.5 &#x3bc;m or greater and less than 2 &#x3bc;m, the thin metal wires form a mesh pattern, a line width L &#x3bc;m of the thin metal wires and an opening ratio A % of the mesh pattern satisfy a relationship represented by Formula (I), and a reflectivity of the thin metal wires at a wavelength of 550 nm is 80% or less. Formula (I): 70&#x2264;A&#x3c;(10&#x2212;L/15).

Conductive film, touch panel sensor, and touch panel

The present invention provides a barrier laminate including at least one inorganic barrier layer and at least one organic layer, wherein the organic layer is a layer formed of a polymerizable composition comprising a polymerizable compound represented by general formula (1) below; and a gas barrier film including the barrier laminate and a support that preferably contains a resin consisting of a polymer or a copolymer comprising a cyclic olefin within a repeating unit or a polycarbonate resin: wherein R represents hydrogen atom or methyl group, and Rs may be the same or different to each other.

Barrier laminate and gas barrier film

An under layer film having excellent surface planarity is provided. In one aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A) containing an ethylenic unsaturated group (P) and a nonionic hydrophilic group (Q), and having a weight average molecular weight of 1,000 or larger; and a solvent (B), the resin (A) having an acid value of smaller than 1.0 mmol/g. In another aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A2) containing an ethylenic unsaturated group (P), and containing, as a nonionic hydrophilic group (Q), a cyclic substituent (Q2) having a carbonyl group in the cyclic structure thereof, with a weight average molecular weight of 1,000 or larger; and a solvent (B).

Under layer film-forming composition for imprints and method of forming pattern

Provided is the pattern formability and line edge roughness of the resultant substrate. An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger:the Ohnishi parameter=(total number of atoms)/(number of carbon atoms&#x2212;number of oxygen atoms).&#x2003;&#x2003;(Equation 1)

Underlay film composition for imprints and method of forming pattern and pattern formation method using the same

In production of a mold having a deposited film on the surface thereof as a mold release layer, a quartz substrate plasma etched employing an etching gas that includes a sedimentary gas to form a pattern of protrusions and recesses having a desired shape in a structure constituted by the quartz substrate and a mask layer, while a deposited film constituted by sediment of the sedimentary gas is formed along the pattern of protrusions and recesses. The deposited film becomes the mold release layer. Thereby, throughput of mold production is improved in the production of molds having deposited films as mold release layers on the surfaces thereof.

Method for producing molds

Provided is an adhesion-promoting composition between a curable composition for imprints and a substrate, which excellent in adhesiveness and can control pattern failure. An adhesion-promoting composition used between a curable composition for imprints and a substrate, which comprises a compound having a molecular weight of 500 or larger and having a reactive group, and has a content of a compound, with a molecular weight of 200 or smaller, of more than 1% by mass and not more than 10% by mass of a total solid content.

Adhesion-promoting composition used between curable composition for imprints and substrate, and semiconductor device using the same

[Problem] Provided is a novel lubricant composition that is useful as a material of a lubricating layer of a magnetic recording medium. [Means for Resolution] The lubricant composition contains at least one kind of compound represented by the following Formula (1). In the formula, X represents a cyclic group that may be substituted, and Y represents a single bond or a linking group having a valency of 2 or more. Here, at least one of X and Y includes 1 or more polar groups such as a hydroxyl group; Z represents a linking group having a valency of 2 or more and constituted with a carbon atom (C), a fluorine atom (F), and 1 or 2 kinds of arbitrary atoms (here, a hydrogen atom is excluded); n represents a real number of 1 to 10; m represents a real number of 0 to 1; and s and t independently represent a real number of 1 or greater.XYZ&#x2014;CFH]]&#x2003;&#x2003;(1)

Lubricant composition and use thereof

Disclosed is a lubricant composition comprising at least one kind of compound represented by following formula (1):  where X represents a cyclic group that may be substituted; Y represents a divalent or higher-valent linking group having at least one polar group and having no aromatic cyclic group; p1 represents an integer of 1 to 4; p2, p3, and p4 each represent an integer of 0 to 4; q represents an integer of 0 to 30; n represents an integer of 1 to 10; s represents an integer of 1 to 4; and t represents an integer of 2 to 10.

Growing community of inventors

Minami-ashigara, Japan

Akiko Hattori