Fuji Electric Co., Ltd.

Akihiro Otsuki

Hidekazu Tsuchida

Akira Saito

Takeshi Tawara

Tomohisa Kato

Yoshiyuki Yonezawa

Kazutoshi Kojima

Kazuo Nimura

Tetsuya Miyazawa

Michio Ohsawa

Norio Fujiwara

A method for manufacturing an epitaxial wafer comprising a silicon carbide substrate and a silicon carbide voltage-blocking-layer, the method includes: epitaxially growing a buffer layer on the substrate, doping a main dopant for determining a conductivity type of the buffer layer and doping an auxiliary dopant for capturing minority carriers in the buffer layer at a doping concentration less than the doping concentration of the main dopant, so that the buffer layer enhances capturing and extinction of the minority carriers, the minority carriers flowing in a direction from the voltage-blocking-layer to the substrate, so that the buffer layer has a lower resistivity than the voltage-blocking-layer, and so that the buffer layer includes silicon carbide as a main component; and epitaxially growing the voltage-blocking-layer on the buffer layer.

Epitaxial wafer manufacturing method, epitaxial wafer, semiconductor device manufacturing method, and semiconductor device

A magnetic recording medium can be produced without substrate heating during sputtering. The recording medium has a substrate, an underlayer of a nonmagnetic film with a bcc structure formed on the substrate, an intermediated layer of a nonmagnetic film with an hcp structure formed on the underlayer, a magnetic layer of a magnetic film with an hcp structure formed on the intermediate layer, and a protective layer formed on the magnetic layer. Materials used for the underlayer, the intermediate layer, and the magnetic layer has spacings between principal lattice planes of the respective crystals that can be expresses as d(between (110) planes in the underlayer)&#x3e;d(between (002) planes in the intermediate layer)&#x3e;d(between (002) planes in the magnetic layer).

Magnetic recording medium with controlled lattice spacing and method of forming thereof

A master magnetic information carrier has embedded magnetic films that are free from protrusion and recess. The master disk is fabricated by the steps of laminating Co-based soft magnetic film on a resin base plate, forming isolated magnetic films in predetermined region by patterning the magnetic film, pressing a die from above the isolated magnetic films while heating the base plate with the magnetic films thereon, and releasing the die. Since the master disk is a mold product fabricated by pressing the die, the embedded magnetic films and the resin surface portion surrounding the magnetic films are intimately adjoined and protrusions and recesses at the boundary between them are suppressed to a minimum. The surface of the master disk is so smooth and flat that generation of flaws and gouges on the magnetic recording medium and transfer of particles and chemical contaminants to the recording medium in the contact duplication process are reduced.

Master magnetic information carrier, fabrication method thereof, and a method for manufacturing a magnetic recording medium

A magnetic recording medium is disclosed comprising a non-magnetic base plate, a magnetic layer formed on said plate, a protective layer comprising silicon dioxide formed on said protective layer, and a lubricant layer comprising amorphous carbon formed on said protective layer. The magnetic recording medium is simple to manufacture and has good CSS resistance, sparing absorptivity and high corrosion resistance.

Magnetic recording medium

Growing community of inventors

Nagano, Japan

Akihiro Otsuki