Hitachi, Ltd.

Hitachi-High-Technologies Corporation

Hitachi Industrial Equipment Systems Co., Ltd.

Hitachi Cable, Inc.

Hitachi-Lg Data Storage, Inc.

Kokusai Electric Co., Ltd.

Hitachi Industries Co., Ltd.

Akihiro Miyauchi

Masahiko Ogino

Takashi Ando

Kyoichi Mori

Noritake Shizawa

Mitsuru Hasegawa

Kosuke Kuwabara

Susumu Komoriya

Ryuta Washiya

Kenya Ohashi

Satoshi Ishii

Takashi Naito

Haruo Akahoshi

Takuya Aoyagi

Mitsuo Hayashibara

Hiroshi Yoshida

Mutsuhiro Mori

Tadashi Fujieda

Hajime Murakami

Kishio Hidaka

Yuichi Sawai

Yuji Miyahara

Hitoshi Suzuki

Shigehisa Motowaki

Norihito Kuno

Toshio Haba

Sigehisa Motowaki

Hiroshi Sasaki

Yasunari Sohda

Kazutoshi Watanabe

Shuichi Suzuki

Kenji Kawasaki

Yoshinori Nakayama

Masaki Shiraishi

Atsuo Watanabe

Hiroya Ohta

Akitoyo Konno

Toshiaki Morita

Souichi Katagiri

Eiichi Ide

Motomune Kodama

Tatsuya Miyake

Hidetoshi Honbo

Takaya Suzuki

Kozo Sakamoto

Kenichi Souma

Shigeru Kikuchi

Yoshiyuki Takamori

Takasumi Ohyanagi

Taigo Onodera

Yuzuru Shimazaki

Chiseki Haginoya

Lee Chahn

Yosuke Inoue

Yohsuke Inoue

Takashi Nogawa

Mariko Miyazaki

Tetsuhiro Hatogai

Akio Yabe

Miho Sasaki

Meguro Takeshi

Shiro Nagashima

Yousuke Inoue

Masaki Sugita

Toshio Andou

Structures are formed in a shape protruding from a wing surface, and a plurality of riblets are formed in a shape depressed from the wing surface. A first cross section obtained by cutting the structure by a flat face that is parallel to a flow and perpendicularly intersects with the wing surface has an inclined side that extends from a point on the wing surface to a top that is a point apart from the wing surface. An inter-structure flow channel is formed between two adjacent structures among the plurality of structures. The area of a face in one of the two structures and the area of a face in the other structure with which a fluid flowing in the inter-structure flow channel comes into contact are different from each other. Accordingly, peeling of the flow can be suppressed and the frictional resistance of the flow can be decreased.

Fluid apparatus

A heat-dissipating structure is formed by bonding a first member and a second member, each being any of a metal, ceramic, and semiconductor, via a die bonding member; or a semiconductor module formed by bonding a semiconductor chip, a metal wire, a ceramic insulating substrate, and a heat-dissipating base substrate including metal, with a die bonding member interposed between each. At least one of the die bonding members includes a lead-free low-melting-point glass composition and metal particles. The lead-free low-melting-point glass composition accounts for 78 mol % or more in terms of the total of the oxides V2O5, TeO2, and Ag2O serving as main ingredients. The content of each of TeO2 and Ag2O is 1 to 2 times the content of V2O5, and at least one of BaO, WO3, and P2O5 is included as accessory ingredients, and at least one of Y2O3, La2O3, and Al2O3 is included as additional ingredients.

Heat-dissipating structure and semiconductor module using same

Mechanical strength of a composite material is enhanced by a simple process. In a composite material comprising a resin or a rubber and an oxide glass, the resin or the rubber is dispersed in the oxide glass, or the oxide glass is dispersed in the resin or the rubber. The composite material has a function that the oxide glass is softened and fluidized by electromagnetic waves.

Composite material

Mechanical strength of a composite material is enhanced by a simple process. In a composite material comprising a resin or a rubber and an oxide glass, the resin or the rubber is dispersed in the oxide glass, or the oxide glass is dispersed in the resin or the rubber, and the oxide glass is softened and fluidized by heating at or lower than a heat decomposition temperature of the resin or the rubber.

A diffraction grating excellent in surface precision and allowing its miniaturization and weight reduction and a method for manufacturing the same. The present invention includes: a glass substrate having a thickness of 0.5 mm to 8 mm; a resin-made microstructure body having an unevenness pattern and formed on one surface of the glass substrate; and a flat resin layer formed on the other surface of the glass substrate. Even if the glass substrate has surface precision of &#x3bb;/2 or greater, the replica of the diffraction grating, in which the microstructure body is not influenced by the surface precision of the glass substrate and which is excellent in surface precision, can be manufactured by the flatness of the resin layer. In addition, since the glass substrate can be made thin, the miniaturization and weight reduction of the diffraction grating can be achieved.

Method for manufacturing a diffraction grating

The present invention is characterized in that a filter made of resin comprises a through-hole film portion (); and a structure reinforce portion (), wherein a through-hole () is provided in a through-hole film portion (), the thickness of the through-hole film portion () is from 0.5 to 2.0 &#x3bc;m, the bore of the through-hole () is from 0.05 to 0.5 &#x3bc;m, the thickness of the structure reinforce portion () is bigger than the thickness of the through-hole film portion (), the structure reinforce portion () encloses the through-hole film portion (), a damage-reduction structure is provided on the upper surface of the structure reinforce portion (), and wherein, the damage-reduction structure may be an uneven structures.

Filter and method of the same

Provided are a method for forming a microfine structure and a microfine structure forming body prepared by the method. The method allows a remaining film part to be formed thinner and more uniform on a substrate than the conventional techniques. The method comprises the steps of: forming an oxide layer on a metallic thin film; a photocurable resin layer via first and second adhesive layers over the oxide layer; and transferring a microfine structure formed on a mold by pressing the mold onto the photocurable resin layer. The first adhesive layer includes a compound having at least two hydrolysable functional groups, and the second adhesive layer includes a compound having at least a hydrolysable functional group and a reactive functional group.

Microfine structure formation method and microfine structure formed body

A microstructure transferring device is characterized in that the device comprises a stamper made from a first photo-curable resin composition cured with light with a first wavelength, and a light source emitting light with a second wavelength longer than the first wavelength. The microstructure is transferred to an impression receptor supplied with a second photo-curable resin composition, which is curable with light with the second wavelength emitted by the light source.

Device and method for transferring micro structure

A fine metal structure having its surface furnished with microprojections of high strength, high precision and large aspect ratio; and a process for producing the fine metal structure free of defects. There is provided a fine metal structure having its surface furnished with microprojections, characterized in that the microprojections have a minimum thickness or minimum diameter ranging from 10 nanometers to 10 micrometers and that the ratio between minimum thickness or minimum diameter (D) of microprojections and height of microprojections (H), H/D, is greater than 1. There is further provided a process for producing a fine metal structure, characterized by comprising providing a substrate having a fine rugged pattern on its surface, applying a molecular electroless plating catalyst to the surface, thereafter carrying out electroless plating to thereby form a metal layer having the rugged pattern filled, and detaching the metal layer from the substrate to thereby obtain a fine metal structure furnished with a surface having undergone reversal transfer of the above rugged pattern.

Fine metal structure, process for producing the same, fine metal mold and device

The present invention provides a nano-imprinting resin stamper including a micro structure layer on a transmissive support basal material, the micro structure layer being formed of a polymer of a resin composition that contains a silsesquioxane derivative as a major constituent having a plurality of polymerizable functional groups, another polymerizable resin component having a plurality of polymerizable functional groups and different from the silsesquioxane derivative, and a photopolymerizable initiator, in which the content percentage of the photopolymerizable initiator is equal to or more than 0.3 mass % and equal to or less than 3 mass % relative to a total mass of the silsesquioxane derivative and the polymerizable resin component, and the micro structure layer permits equal to or more than 80% of light to pass therethrough at a wavelength of 365 nm.

Nano-imprinting resin stamper and nano-imprinting apparatus using the same

A micro-pattern transferring stamper includes a supporting base material and a microstructure layer formed on the supporting base material, the microstructure layer is a polymer of a resin composition that mainly contains a silsesquioxane derivative containing a plurality of polymerizable functional groups, and one or plural kinds of monomer elements containing a plurality of polymerizable functional groups.

Micro-pattern transferring stamper

A mold and a pattern transfer method using the same for a nanoprinting technology. The mold can be released from a substrate accurately and easily. The mold, which is used for forming a fine pattern on a substrate using a press machine, comprises a release mechanism.

Mold structures, and method of transfer of fine structures

An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups.

Stamper for transferring fine pattern and method for manufacturing thereof

An object of the present invention is to provide a micropattern transfer method and a micropattern transfer device in which the small amount of resin is applied to a substrate, and the nonuniformity in thickness is prevented to arise on the obtained pattern forming layer. In order to achieve the above object, the present invention provides a micropattern transfer method in which a micropattern is transferred to a resin by pressing a stamper having the micropattern onto the resin applied to a substrate, including the steps of: applying the resin to a surface of the substrate discretely in order to obtain a plurality of resin islands so that a center portion of each of the resin islands forms a planar thin-film, and a peripheral portion of the resin island rises higher than the center portion.

Micropattern transfer method and micropattern transfer device

In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.

Pattern transfer method and imprint device

Growing community of inventors

Hitachi, Japan

Akihiro Miyauchi