Hitachi Chemical Company, Ltd.

Hitachi, Ltd.

Asahi Denka Kogyo K.k.

Akihiro Kobayashi

Takayuki Saito

Toshiyuki Fujita

Kiyotaka Mashita

Atsushi Fujioka

Fumiaki Kanega

Shinsuke Hagiwara

Haruaki Sue

Hiromasa Kawai

Fumio Furusawa

Toshio Akima

Seiichi Akagi

Hideaki Shibata

Takayuki Saitoh

Toru Kikuchi

Yutaka Hosoi

Hideki Yokoyama

Tohru Haruna

Takashi Takeuchi

Isamu Moribe

Yuji Kobayashi

Yuugo Kumagai

Hitoshi Goto

Masakatsu Obara

This invention provides a compound suitable as an encapsulating material for electronic devices and having a high Tg, low moisture-absorption, high adhesion and fluidity which is a cyclopentylene compound represented by Formula (I) and its intermediate cyclopentenyl compound represented by Formula (III). In the formula, m is 0 or more, Ar and Ar are each a phenol residual group, a naphthol residual group or a fluorene derivative residual group, and each contain a hydroxyl group or a glycidyloxyl group.

Phenyl, naphthly or fluorene cyclopentyl epoxy resins

This invention provides a compound suitable as an encapsulating material for electronic devices and having a high Tg, low moisture-absorptive, high adhesion and rich fluidity, which is a cyclopentylene compound represented by Formula (I) and its intermediate cyclopentenyl compound represented by Formula (III). In the formula, m is 0 or more, Ar,and Ar,are each a phenol residual group, a naphthol residual group or a fluorene derivative residual group, and each contain a hydroxyl group or a glycidyloxyl group.

Phenyl, naphthyl or fluorene cyclopentyl epoxy resins

A macromolecular material composition which comprises a macromolecular material and a modifier which comprises a polyvinyl cyclohexane compound having hydroindane structure. The modifier improves melt flow characteristics, flexibility at a low temperature, and mechanical characteristics, such as bending modulus and bending strength, of the material, and do not bleed or give bad smell.

Macromolecular material composition and a modifier for macromolecular

A method for preparing a trimer of .alpha.-methyl styrene or derivatives thereof, wherein .alpha.-methyl styrene or derivatives thereof is added to an organic solvent comprising Lewis acid is provided. According to the method, the trimer of .alpha.-methyl styrene or derivatives thereof can be obtained in high yield.

Method for preparing trimer of .alpha.-methyl styrene or derivatives

A brominated 1,3-dimethyl-3-phenyl-1-(2-methyl-2-phenylpropyl) indane herein disclosed is represented by the following general formula (I): ##STR1## (wherein x and z each independently represents an integer ranging from 0 to 5, y represents an integer ranging from 0 to 4, provided that x+y+z&gt;1). The compound can be prepared by a method which comprises the step of reacting 1,3-dimethyl-3-phenyl-1-(2-methyl-2-phenylpropyl) indane with a bromination agent. The brominated indane is excellent in flame-resistance, has a high thermal decomposition temperature and never generates brominated dioxine and/or brominated dibenzofuran when burning at a specific temperature. Therefore, the compound is suitably used for imparting flame-resistance to a variety of thermoplastic and thermosetting resins.

Brominated 1,3-dimethyl-3-phenyl-1-(2-methyl-2-phenylpropyl)-indane and

In a process for producing a methacrylic acid ester by subjecting methyl methacrylate and an alcohol to a transesterification reaction in the presence of a catalyst and a polymerization inhibitor, the filtration time of catalyst and the like can be shortened by making a total water content in the catalyst, alcohol and methyl methacrylate 1000 ppm or less, or the generation of large bubbles during the reaction can be prevented by adding the starting alcohol to the reaction system at the alcohol conversion of 40% or more, or high catalytic activity is obtained even if a secondary or tertiary alcohol is used as a starting material by using as a catalyst that obtained by drying lithium hydroxide monohydrate with heating, these effects being also obtained by combining individual conditions.

Process for producing methacrylic acid esters

An optical resin material comprising a polymer containing as an essential component at least one norbornyl acrylate or methacrylate or a derivative thereof is excellent in properties, particularly in moisture resistance and can be used for molding optical elements such as lenses, optical discs, etc.

Lens and optical disc base plate obtained from copolymer of norbornyl

Methacrylate esters of alcohols having an ether linkage and/or an alicyclic ring can be obtained with no trouble of coloration or polymer formation during the production and for the product. An alcohol having an ether linkage and/or an alicyclic ring is treated with an alkaline substance, and the treated alcohol is caused to react with methyl methacrylate for a transesterification reaction in the presence of an alkaline substance.

Method for production of methacrylate ester

Optical resin material

A toner for developing latent electrostatic images comprising a copolymer having as an essential component a monomer unit derived from an imido group-containing unsaturated monomer of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are as defined in the specification, has excellent properties such as resistance to adhesion to plasticized polyvinyl chloride, high image density, resistance to fogging, etc.

Electrophoto toner comprising imido group monomer unit in polymer

An epoxy resin composition comprising (A) an epoxy resin, (B) an alicyclic or aromatic polycarboxylic acid anhydride, (C) 4-ketopimelic acid dilactone, and if necessary (D) a hardening accelerator can give a cured article having excellent properties such as elongation, flexibility, hardness, tensile strength, etc.

Epoxy resin composition

A lactone of the formula: ##STR1## wherein R.sub.1 through R.sub.8 are independently hydrogen or C.sub.1-5 alkyl, obtained by decarboxylation condensation reaction of a saturated alicyclic 1,2-dicarboxylic acid anhydride, is a good curing agent for thermosetting resins.

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Ichihara, Japan

Akihiro Kobayashi