Fujifilm Corporation

Ricoh Company, Ltd.

Akihiro Kaneko

Kazumi Suzuki

Yoshitaka Yamauchi

Takashi Kawashima

Akiyoshi Goto

Hisashi Nakajima

Toyoshi Sawada

Michihiro Ogawa

Tomotaka Tsuchimura

Katsunori Kurose

Michihiro Shirakawa

Yu Naito

Hajime Furutani

Kohtaroh Ogino

Koji Takaku

Yasunori Yonekuta

Yuki Hirai

Kazunari M Yagi

Hiroki Sugiura

Kensuke Masui

Masafumi Kojima

Masashi Koyanagi

Minoru Uemura

Namie Suzuki

Hisashi Mikoshiba

Junichi Ito

Hideaki Tsubaki

Nekka Matsuura

Shuji Hirano

Kei Yamamoto

Naoyuki Hanaki

Masaki Yoshino

Masaaki Tsukase

Wataru Nihashi

Saori Yamada

Mitsuhiro Fujita

Hyo Shu

Toshihiko Yawata

Kyohei Sakita

Yasuharu Shiraishi

Hironori Oka

Masataka Satou

Teruyuki Suzuki

Motoshi Iizuka

An actinic ray-sensitive or radiation-sensitive resin composition includes a resin and a compound that generates an acid upon irradiation with actinic rays or radiation, in which an A value determined by Formula (1) is 0.130 or more, and the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more selected from the group consisting of a compound (I) to a compound (III).

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern thus formed has excellent LER and collapse suppressing ability. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention includes a compound that generates an acid upon irradiation with actinic rays or radiation, and a resin whose polarity increases by the action of an acid, in which the resin includes a repeating unit represented by General Formula (B-1), and a content of the repeating unit represented by General Formula (B-1) is 5% to 70% by mass with respect to all the repeating units in the resin. In General Formula (B-1), Ri represents a hydrogen atom or an organic group, the Ring W1 represents a ring which includes at least one carbon atom and one nitrogen atom, and may have a substituent

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resin

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes an acid-decomposable resin having a repeating unit represented by General Formula (1), and a compound that generates an acid upon irradiation with actinic rays or radiation.

An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin.MA-L-BM  (I)

A toner includes polyolefin and has an exothermic peak in a range from 40° C. to 70° C. in a cooling process of the polyolefin by the DSC after a first heating process of the polyolefin by DSC. The polyolefin does not have an exothermic peak in the cooling process of the polyolefin by the DSC after the first heating process of the polyolefin by the DSC, and has an exothermic peak in a range from 0° C. to 30° C. in a second heating process of the polyolefin by the DSC.

Toner, developer, toner set, toner receiving unit, image forming apparatus, and image forming method

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a polarity that increases by the action of an acid; and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the resin has a repeating unit represented by General Formula (B-1).

Printed matter is provided which includes a recording medium, a colored layer overlying the recording medium, and an infrared-absorbing-pigment-containing layer overlying the recording medium and underlying the colored layer. The colored layer contains a colorant. The infrared-absorbing-pigment-containing layer contains an infrared absorbing pigment having an average diameter of from 120 to 250 nm in the infrared-absorbing-pigment-containing layer.

Printed matter, infrared-absorbing-pigment-containing toner, tonner set, image forming method, and image forming apparatus

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition that can provide a resist film with excellent sensitivity and a pattern with excellent LER performance, and can suppress pattern collapse during pattern formation. In addition, the present invention also provides a resist film, a pattern forming method, a mask blank with a resist film, a method for producing a photomask, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin X having a repeating unit A represented by General Formula (I), a repeating unit B having an acid-decomposable group, and a repeating unit C selected from a repeating unit c1 represented by General Formula (II) and the like; a compound Y which is a basic compound or ammonium salt compound whose basicity is reduced upon irradiation with actinic rays or radiation; and a photoacid generator Z which is a compound other than the compound Y. 

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device

Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin including a repeating unit (a) represented by Formula (1); (B) a compound that generates an acid by irradiation with actinic rays or radiation; and (C) an organic solvent. A concentration of solid contents of the actinic ray-sensitive or radiation-sensitive resin composition is 4 mass % or less. (in the formula, Rand Reach independently represent a hydrogen atom, a halogen atom, or a monovalent organic group. Rrepresents a hydrogen atom, a halogen atom, or a monovalent organic group or is a single bond or an alkylene group, and is bonded to L or Ar in the formula to form a ring. L represents a single bond or a divalent linking group. Ar represents an aromatic ring group. n represents an integer of 2 or more.) 

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device

An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a group represented by General Formula (1) and a compound that generates an acid upon irradiation with actinic rays or radiation. 

A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Conditions 1 and 2,

Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device

A toner is provided. The toner comprises a maleic-acid-modified polyolefin having a polypropylene block in a main chain and having a weight average molecular weight of 60,000 or more.

Toner, toner accommodating unit, image forming apparatus, and image forming method

A toner including a strontium titanate powdery material as an external additive, the strontium titanate powdery material including Si-containing particles on a surface of the strontium titanate powdery material, the Si-containing particles having a number average circle equivalent diameter of 5 nm or more but 15 nm or less.

Toner, toner stored container, developer, developing device, process cartridge, and image forming apparatus

Provided is a toner including toner particles, each toner particle includes: a base particle including a binder resin; and external additive particles, wherein the external additive particles include particles each having an equivalent circle diameter of 10 nm or greater, a volume average particle diameter of the particles each having an equivalent circle diameter of 10 nm or greater is 80 nm or greater but 140 nm or less, and a ratio (circumscribed circle area/particle area) of a circumscribed circle area of the particle having an equivalent circle diameter of 10 nm or greater to a particle area of the particle having an equivalent circle diameter of 10 nm or greater is 1.60 or greater but 2.60 or less.

Toner, toner stored unit, and image forming apparatus

A toner is provided. The toner includes at least two types of polyester resins and a release agent. When the toner is subjected to a dynamic viscoelasticity measurement at a frequency of 6.28 rad/sec to obtain a temperature-dependent curve of loss tangent (tan &#x3b4;), and the temperature-dependent curve is differentiated one time with temperature, a resulting curve has a maximum value of 0.07 or more and a minimum value of 0.025 or less within a temperature range of from 85&#xb0; C. to 110&#xb0; C. When the toner is subjected to a differential scanning calorimetry (DSC), an endothermic amount measured in a first temperature rising in the DSC is 3.5 J/g or less within a temperature range of from 85&#xb0; C. to 120&#xb0; C.

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Shizuoka, Japan

Akihiro Kaneko