Tdk Corporation

Akihiro Horita

Naoki Kubota

Toru Sasaki

Hiroshi Tanabe

Hisayuki Abe

Yoshikazu Ito

Takashi Sakurai

Satoshi Kurimoto

Hiroshi Shindo

Ko Onodera

Genichi Watanabe

Shinya Yoshihara

Masahiko Konno

Satoshi Tokura

Kengo Fukuyu

Masaaki Koishi

There are provided a ceramic electronic component and a method for producing the ceramic electronic component, where a ground electrode layer can be directly coated with lead-free solder without lowering reliabilities. Terminal electrodeis provided with a ground electrode layerof Cu having been formed by firing, a solder layerformed of a lead-free solder based on five elements of Sn&#x2014;Ag&#x2014;Cu&#x2014;Ni&#x2014;Ge, and a diffusion layerhaving been formed by the diffusion of Ni between the ground electrode layerand the solder layer. Because the diffusion layerof Ni is formed between the ground electrode layerand the solder layer, the diffusion layer, which functions as a barrier layer, suppresses the solder leach of Cu from the ground electrode layer. The diffusion layerof Ni can also suppress the growth of fragile intermetallic compounds of Sn&#x2014;Cu. Therefore, a decrease in the bonding strength between the ground electrode layerand the solder layercan be prevented.

Ceramic electronic component and method for producing same

An etching depth measuring device for measuring the etching depth of an object to be processed, when etching the object to be processed by using active species present in a plasma, the etching depth measuring device comprising: a chamber in which is formed an introduction port for introducing a part of the active species; a member to be processed which is housed in the chamber and etched by the part of the active species; and a mass detecting element which receives a substance generated from the member to be processed and detects the mass of the received substance.

Etching depth measuring device, etching apparatus, and etching depth measuring method

An ion source, comprising: a discharge chamber, in which is formed an opening; a coil, provided outside said discharge chamber, for generating plasma within said discharge chamber; an extraction electrode, which extracts ions in said plasma generated in said discharge chamber from said opening and generates an ion beam; a power supply device, which supplies power to said coil; and a control device, which can repeatedly halt output power output from said power supply device over prescribed intervals, while maintaining a value of said output power at a value, set in advance, which renders radial direction distribution of ion beam intensity of said ion beam uniform.

Ion source with uniformity of radial distribution of ion beam intensity

An evaporation source includes an insulating container adapted to receive a volume of source material therein and a heater closely disposed around the container for heating and evaporating the source material into a vapor. The effective contact area of the container in contact with the source material is correlated to the volume of source material. The evaporation source is useful in the preparation of organic EL devices.

Evaporation source, apparatus and method for the preparation of organic El device

Growing community of inventors

Tokyo, Japan

Akihiro Horita