Rigaku Corporation

Akihiro Himeda

Keigo Nagao

Akito Sasaki

Atsushi Ohbuchi

Takayuki Konya

Yukiko Ikeda

Kazuhiko Omote

Hiroki Yoshida

Tetsuya Ozawa

Hideo Toraya

Toru Mitsunaga

Go Fujinawa

Keiichi Morikawa

Hisashi Konaka

Takahiro Kuzumaki

Miki Kasari

A quantitative analysis apparatus, a method, a program, and a manufacturing control system are provided. A WPPF sectionfor determining parameters of theoretical diffraction intensity by performing whole powder pattern fitting with respect to an X-ray diffraction profile to be analyzed, a scale factor acquiring sectionfor acquiring a scale factor of a test component among the determined parameters, a calibration curve storing sectionfor storing a calibration curve indicating a correlation between scale factors of the test component acquired with respect to a standard sample and content ratios of the test component in the standard sample, and a conversion sectionfor converting the scale factor of the test component acquired with respect to an objective sample into the content ratio of the test component in the objective sample using the stored calibration curve, are comprised.

Quantitative analysis apparatus, method and program and manufacturing control system

An analysis apparatus, an analysis method, and an analysis program by which even unskilled ones can perform quantitative analysis of a composition of high-performance cement with high precision. An analysis apparatusfor performing quantitative analysis of components of cement, includes: a content percentage conversion unitfor converting content percentages of major elements of a cement sample to content ratios of main crystal phases composing the cement sample by predetermined formulae, the content percentages being obtained as an elemental analysis result; a scale factor estimation unitfor estimating initial values of scale factors of Rietveld analysis from the content ratios of main crystal phases obtained in the conversion; and a Rietveld analysis unitfor performing Rietveld analysis with respect to an X-ray diffraction measurement result of the cement sample using the initial values of scale factors previously been estimated to calculate content percentages of respective phases of the cement sample.

Analysis apparatus, analysis method and analysis program

Provided are an operation guide system, an operation guide method, and an operation guide program, which are capable of allowing a user to easily understand measurement of an X-ray optical system to be selected. A quantitative phase analysis device includes qualitative phase analysis result acquisition means for acquiring information on a plurality of crystalline phases contained in a sample, and weight ratio calculation means for calculating a weight ratio of the plurality of crystalline phases based on a sum of diffracted intensities corrected with respect to a Lorentz-polarization factor, a chemical formula weight, and a sum of squares of numbers of electrons belonging to each of atoms contained in a chemical formula unit, in the plurality of crystalline phases.

Quantitative phase analysis device, quantitative phase analysis method, and quantitative phase analysis program

Provided are a processing method, a processing apparatus and a processing program which can perform pole figure measurement continuously without overlapping of an angle a in a pole figure with the small number of times of &#x3d5; scan, thereby enabling the efficient measurement. The processing method for determining conditions of pole figure measurement by X-ray diffraction, includes the steps of. receiving input of a diffraction angle 2&#x3b8;; and determining an angle &#x3c9; formed by an incident X-ray and an x-axis, and a tilt angle &#x3c7; of a sample in each &#x3d5; scan for a rotation angle &#x3d5; within a sample plane so as to make a range of an angle a continuous from &#x3b1;=90&#xb0; to &#x3b1;=0&#xb0; without overlapping, the angle &#x3b1; being formed by the sample plane and a scattering vector, the range of the angle &#x3b1; are detectable at a time on a two-dimensional detection plane in the pole figure measurement at the diffraction angle 2&#x3b8;, in which determining the angle &#x3c9; and the tilt angle &#x3c7; is repeated.

Processing method, processing apparatus and processing program configured to determine conditions of pole figure measurement by X-ray diffraction

A method for displaying measurement results from X-ray diffraction measurement, in which a sample is irradiated with X-rays and the X-rays diffracted by the sample are detected by an X-ray detector, comprises: (1) forming a one-dimensional diffraction profile by displaying, on the basis of output data from an X-ray detector, a profile in which one orthogonal coordinate axis shows 2&#x3b8; angle values and another orthogonal coordinate axis shows X-ray intensity values; (2) forming a two-dimensional diffraction pattern by linearly displaying X-ray intensity data, for each 2&#x3b8; angle value and on the basis of output data from the X-ray detector; the X-ray intensity data being present in the circumferential direction of a plurality of Debye rings formed at each 2&#x3b8; angle by diffracted X-rays; and (3) displaying the two-dimensional diffraction pattern and the one-dimensional diffraction profile so as to be aligned such that the 2&#x3b8; angle values of both coincide with each other.

Method for displaying measurement results from x-ray diffraction measurement

Provided are operation guide system for X-ray analysis to enable users to easily understand measurement of X-ray optical system to be selected. The operation guide system includes: measurement information acquisition unit for acquiring information on a sample and each X-ray measurement optical system part; sample magnification acquisition unit for acquiring magnification for display; incident X-ray shape deformation unit for determining distorted shape of an incident X-ray obtained by magnifying shape of the incident X-ray based on the magnification in a plane perpendicular to an optical axis direction; scattered X-ray shape deformation unit for determining distorted shape of a scattered X-ray obtained by magnifying shape of the scattered X-ray based on the magnification in the plane; and X-ray measurement optical system modeling unit for modeling a deformed shape of the sample, the distorted shape of the incident X-ray, and the distorted shape of the scattered X-ray.

Operation guide system for X-ray analysis,operation guide method therefor, and operation guide program therefor

A crystalline phase contained in a sample is identified, from X-ray diffraction data of the sample which contain data of a plurality of ring-shaped diffraction patterns, using a database in which are registered data related to peak positions and peak intensity ratios of X-ray diffraction patterns for a plurality of crystalline phases. Peak positions and peak intensities for a plurality of the diffraction patterns are detected from the X-ray diffraction data (step), and the circumferential angle versus intensity data of the diffraction patterns is created (step). The diffraction patterns are grouped into a plurality of clusters on the basis of the circumferential angle versus intensity data (step). Crystalline phase candidates contained in the sample are searched from the database on the basis of sets of ratios of peak positions and peak intensities of the diffraction patterns grouped into the same cluster (step).

Crystalline phase identification method, crystalline phase identification device, and X-ray diffraction measurement system

Peak positions and integrated intensities of diffraction X-ray are determined on the basis of X-ray diffraction measurement data output from an X-ray diffractometer, the number of determined peaks of the diffraction X-ray is counted, and analysis processing is started when the counted number of peaks reaches a preset peak number. The analysis processing is repetitively executed on the basis of X-ray diffraction measurement data. The peak positions and the integrated intensities of the diffraction X-ray are determined from the X-ray diffraction measurement data obtained from the start of the measurement till the analysis processing concerned, and qualitative analysis of collating the determined peak positions and integrated intensities with standard peak card data whose data base is made in advance and searching materials contained in a measurement sample, and quantitative analysis of determining the quantities of the materials contained in the measurement sample are executed.

Analysis method for X-ray diffraction measurement data

The thickness of a thin film can be measured based on the X-ray diffraction method. An X-ray is allowed to be incident upon a surface of the thin film. An intensity of a diffracted X-ray is measured with the incident angle &#x3b1; being changed to obtain a measured rocking curve. On the other hand, a theoretical rocking curve is calculated in consideration of an orientation density distribution function &#x3c1; of the thin film. A scale factor is predetermined for a standard sample having a known film thickness. A parameter fitting operation is carried out in a manner that the characteristic parameter of the function &#x3c1; and the film thickness t are adjusted so that the theoretical rocking curve including the scale factor can approach the measured rocking curve as closely as possible.

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Akishima, Japan

Akihiro Himeda