Growing community of inventors

Osaka, Japan

Akihiro Furuta

Average Co-Inventor Count = 3.26

ph-index = 9

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 258

Akihiro FurutaTakezo Sano (6 patents)Akihiro FurutaYukikazu Uemura (4 patents)Akihiro FurutaHaruo Inoue (4 patents)Akihiro FurutaNobuhiro Usui (3 patents)Akihiro FurutaMakoto Hanabata (3 patents)Akihiro FurutaHiroyuki Takewa (2 patents)Akihiro FurutaSeimei Yasui (2 patents)Akihiro FurutaMikio Iwasa (2 patents)Akihiro FurutaKazue Satoh (2 patents)Akihiro FurutaYuji Nakai (2 patents)Akihiro FurutaTadanori Inoue (2 patents)Akihiro FurutaKuniaki Sakai (2 patents)Akihiro FurutaTetsuya Tanaka (1 patent)Akihiro FurutaYasunori Uetani (1 patent)Akihiro FurutaMasahito Matsumoto (1 patent)Akihiro FurutaNobuo Higaki (1 patent)Akihiro FurutaShinya Mizone (1 patent)Akihiro FurutaKunihiko Tanaka (1 patent)Akihiro FurutaKatsuji Ueno (1 patent)Akihiro FurutaJun Tomioka (1 patent)Akihiro FurutaHaruyoshi Osaki (1 patent)Akihiro FurutaTakeshi Hioki (1 patent)Akihiro FurutaSatoru Funakoshi (1 patent)Akihiro FurutaRyotaro Hanawa (1 patent)Akihiro FurutaFumio Oi (1 patent)Akihiro FurutaKaoru Iwakuni (1 patent)Akihiro FurutaNaoyoshi Jinno (1 patent)Akihiro FurutaTsuneyuki Suzuki (1 patent)Akihiro FurutaShinji Konishi (1 patent)Akihiro FurutaTakanori Yamamoto (1 patent)Akihiro FurutaOsamu Hiroaki (1 patent)Akihiro FurutaTakao Ninomiya (1 patent)Akihiro FurutaToru Inoue (1 patent)Akihiro FurutaAkihiro Furuta (20 patents)Takezo SanoTakezo Sano (32 patents)Yukikazu UemuraYukikazu Uemura (8 patents)Haruo InoueHaruo Inoue (6 patents)Nobuhiro UsuiNobuhiro Usui (60 patents)Makoto HanabataMakoto Hanabata (13 patents)Hiroyuki TakewaHiroyuki Takewa (37 patents)Seimei YasuiSeimei Yasui (21 patents)Mikio IwasaMikio Iwasa (13 patents)Kazue SatohKazue Satoh (11 patents)Yuji NakaiYuji Nakai (8 patents)Tadanori InoueTadanori Inoue (6 patents)Kuniaki SakaiKuniaki Sakai (2 patents)Tetsuya TanakaTetsuya Tanaka (98 patents)Yasunori UetaniYasunori Uetani (82 patents)Masahito MatsumotoMasahito Matsumoto (64 patents)Nobuo HigakiNobuo Higaki (58 patents)Shinya MizoneShinya Mizone (26 patents)Kunihiko TanakaKunihiko Tanaka (24 patents)Katsuji UenoKatsuji Ueno (22 patents)Jun TomiokaJun Tomioka (20 patents)Haruyoshi OsakiHaruyoshi Osaki (20 patents)Takeshi HiokiTakeshi Hioki (20 patents)Satoru FunakoshiSatoru Funakoshi (16 patents)Ryotaro HanawaRyotaro Hanawa (13 patents)Fumio OiFumio Oi (9 patents)Kaoru IwakuniKaoru Iwakuni (4 patents)Naoyoshi JinnoNaoyoshi Jinno (4 patents)Tsuneyuki SuzukiTsuneyuki Suzuki (3 patents)Shinji KonishiShinji Konishi (2 patents)Takanori YamamotoTakanori Yamamoto (2 patents)Osamu HiroakiOsamu Hiroaki (1 patent)Takao NinomiyaTakao Ninomiya (1 patent)Toru InoueToru Inoue (1 patent)
..
Inventor’s number of patents
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Strength of working relationships

Company Filing History:

1. Sumitomo Chemical Company, Limited (14 from 6,896 patents)

2. Matsushita Electric Industrial Co., Ltd. (6 from 27,375 patents)

3. Hayashibara Biochemical Laboratories, Inc. (1 from 30 patents)


20 patents:

1. 7305499 - DMA controller for controlling and measuring the bus occupation time value for a plurality of DMA transfers

2. 6598198 - Deinterleaving device that releases a plurality of types of interleaving simultaneously

3. 6247034 - Fast fourier transforming apparatus and method, variable bit reverse circuit, inverse fast fourier transforming apparatus and method, and OFDM receiver and transmitter

4. 6197245 - Process for producing hollow resin molded article

5. 6187251 - Process for producing thermoplastic resin hollow molded article

6. 6115728 - Fast fourier transforming apparatus and method, variable bit reverse

7. 5922270 - Process for producing molded article having a hollow portion from a

8. 5862242 - Speaker

9. 5664024 - Loudspeaker

10. 5354644 - Photoresist compositions comprising styryl compound

11. 4863829 - Positive type high gamma-value photoresist composition with novolak

12. 4812551 - Novolak resin for positive photoresist

13. 4696886 - Positive photoresist composition with m-hydroxy-.alpha.-methylstyrene

14. 4309513 - Novel resin compositions based on polyphenylene ether

15. 4302528 - Process for producing photo-curable composite materials useful for

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