Kawasaki Kasei Chemicals Ltd.

Yokohama National University

Akihiko Yamada

Shigeaki Numata

Shuji Yokoyama

Yasuaki Miki

Shunichi Himori

Keita Iuchi

Hidehiko Tanaka

Hiroaki Gotoh

Kazuhisa Sakakibara

Tatsuki Takeuchi

A radical polymerization method may use a compound having a polycyclic aromatic skeleton and an endoperoxide compound having a polycyclic aromatic skeleton. An endoperoxide compound may have a polycyclic aromatic skeleton of formula (1), and a compound may have a polycyclic aromatic skeleton, which is a raw material of the endoperoxide compound: wherein R is a Calkyl group, an alkoxymethyl group having a Calkoxy group, a Caryl group, an alkylcarbonyl group having a Calkyl group, an arylcarbonyl group having a Caryl group, an alkyloxycarbonyl group having a Calkyl group, an aryloxycarbonyl group having a Caryl group, an alkyloxycarbonylmethyl group having a Calkyl group or an aryloxycarbonylmethyl group having a Caryl group.

Compound having polycyclic aromatic skeleton, and endoperoxide compound of same

A photopolymerization sensitizer may not cause problems of dusting or coloring of a cured product due to bleeding of additives such as the photopolymerization sensitizer on the surface, e.g., by blooming at the time of photo-curing or during storage of the cured product, and which provides a practically sufficient photo-curing rate. A 9,10-bis(alkoxycarbonylalkyleneoxy)anthracene compound having ester groups, of formula (I): wherein A is a Calkylene group, optionally branched by an alkyl group, R is a Calkyl group, optionally branched by the alkyl group, the Calkyl group optionally being a cycloalkyl group or a cycloalkylalkyl group, and X and Y are independently a hydrogen, a Calkyl group, or a halogen.

Migration-resistant photopolymerization sensitizer

To provide a photopolymerization sensitizer which will not cause problems of dusting or coloring of a cured product by bleeding of additives such as the photopolymerization sensitizer on the surface e.g. by blooming at the time of photo-curing or during storage of the cured product, and which imparts a practically sufficient photo-curing rate. An oligomer of a 9,10-bis(substituted oxy)anthracene compound having repeating units represented by the following formula (1): wherein n represents a repetition number and is from 2 to 50, each of X and Y which may be the same or different, is a hydrogen atom, a Calkyl group or a halogen atom, and A is a bivalent substituent.

Polymer photopolymerization sensitizer

To provide a photopolymerizable composition which can be quickly cured by light of from 300 nm to 450 nm, and a cured product of which is less colored. A photopolymerization sensitizer composition containing a compound represented by the following formula (1) and a compound, of which the maximum value of an absorption coefficient in a wavelength region ranging from at least 400 nm to at most 500 nm is higher than the maximum value of an absorption coefficient in a wavelength region ranging from at least 400 nm to at most 500 nm of said compound; and a photopolymerizable composition containing the photopolymerization sensitizer composition. In the formula (1), Ris a Calkyl group, a Caryl group, a Calkoxy group or a Caryloxy group, and each of Xand Ywhich may be the same or different, is a hydrogen atom or a Calkyl group 

Photopolymerization sensitizer composition and photopolymerizable composition comprising the same

To provide a photopolymerizable composition which can be quickly cured by light of from 300 nm to 500 nm, and a cured product of which is less colored. A photopolymerizable composition comprising a compound having an anthracene skeleton represented by the following formula (1), a compound having a benzophenone skeleton and a radical polymerizable compound: wherein each of Rand Rwhich may be the same or different, is a Calkyl group, a Caryl group, an alkylcarbonyl group having a Calkyl group, an arylcarbonyl group having a Caryl group, an alkyloxycarbonyl group having a Calkyl group, or an aryloxycarbonyl group having a Caryl group, and each of X and Y which may be the same or different, is a hydrogen atom or a Calkyl group.

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Kawasaki, Japan

Akihiko Yamada