Fuji Photo Film Company, Limited

Akihiko Kamiya

Toshiaki Aoai

Kazuo Maemoto

Toshiyuki Sekiya

Hiroshi Misu

Masanori Imai

Akinobu Koike

Roahiaki Aoai

Disclosed is a novel diazo resin which has at least one repeating unit represented by the following general formula (I): ##STR1## wherein R.sup.2 represents a hydrogen atom, an alkyl group or an alkoxy group, a hydroxyl group, a carboxy ester group or a carboxyl group: R.sup.1 represents a carboxyl group or a group having at least one carboxyl group; R.sup.3 and R.sup.4 each represents a hydrogen atom or an alkyl group or an alkoxy group; X.sup.31 represents an anion; and Y represents --NH--, --O-- or --S--. The diazo resin is useful for a presensitized plate for use in making a lithographic printing plate when it is incorporated into a light-sensitive layer or an underlayer on a substrate. According to the present invention, a presensitized plate using the diazo resin has excellent properties such as high sensitivity, good adhesion between the substrate and the light-sensitive layer and can thus provide a lithographic printing plate having a high printing durability and free of background contamination.

Light-sensitive composition and presensitized plate for use in making

A photosensitive composition is described, comprising a diazonium compound and a polyurethane resin having a carboxyl group in its main chain. The composition can be developed with an aqueous alkali developer to provide a lithographic printing plate having a long press life.

Photosensitive diazo resin composition with polyurethane resin having

A light-sensitive composition which contains a polyurethane resin having a carbon-carbon unsaturated bond and a carboxyl group. A presensitized plate using the above light-sensitive composition can be developed with an aqueous alkaline developing solution and provides a lithographic printing plate having excellent printing durability.

Light-sensitive diazo photopolymerizable composition with polyurethane

A photo-solubilizable composition is disclosed, comprising (a) a compound capable of producing an acid upon being irradiated with actinic light rays, and (b) a compound containing at least one silyl ether group represented by formula (I) ##STR1## that is capable of being decomposed with an acid and at least one group selected from among a urethane group, a ureido group, an amido group, and an ester group, and, according to a preferred embodiment at least one hydrophilic group.

Photo-solubilizable composition admixture with radiation sensitive acid

The present invention relates to a light-sensitive composition comprising a modified polyvinyl acetal resin having a substituent possessing an acid hydrogen atom introduced into remaining hydroxy groups of a polyvinyl acetal resin in an amount of from 0.1 to 6 milliequivalents as acid content per 1 gram resin, and a diazo resin represented by the formula (I) ##STR1## wherein R.sub.1 represents a hydrogen atom, or a substituted or unsubstituted alkyl, alkoxy, hydroxy, carboxyester or carboxy group; R.sub.2 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms or a phenyl group; R.sub.3 represents a hydrogen atom or an alkoxy group having 1 to 3 carbon atoms; R.sub.4 represents an alkyl group having 6 to 18 carbon atoms; n represents an integer not smaller than 2. The presensitized lithographic printing plate using the light-sensitive composition of the present invention can be developed with an alkali developer and the highlight image thereof is tough. The lithographic printing plate obtained from the presensitized plate has increased press life.

Light-sensitive composition with polyvinyl acetal resin and diazo resin

A light-sensitive composition comprising a diazonium compound and a polymer having the recurring units represented by the following general formula (I): ##STR1## wherein R.sub.1 represents a hydrogen atom or a substituted or unsubstituted alkyl group; R.sub.2 represents an unsubstituted alkyl group; R.sub.3 represents an aliphatic or aromatic hydrocarbon group having a carboxyl group; R.sub.4 represents an aliphatic or aromatic hydrocarbon group which has at least one hydroxyl or nitrile group and which may be further substituted; n.sub.1, n.sub.2, n.sub.3, n.sub.4 and n.sub.5 represent the molar percents of the respective recurring units, provided that n.sub.1 is from about 5 to about 85 mol %, n.sub.2 is from 0 to about 60 mol %, n.sub.3 is from 0 to about 20 mol %, n.sub.4 is from about 3 to about 60 mol % and n.sub.5 is from greater than 0 to about 60 mol %.

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Shizuoka, Japan

Akihiko Kamiya