Mitsubishi Denki Kabushiki Kaisha

Mitsubishi Electric Corporation

Akihiko Hosono

Shuhei Nakata

Kazunori Inoue

Takaaki Iwata

Yoshihito Imai

Kazushi Yamayoshi

Kenichi Miyamoto

Naruhito Hoka

Tetsuya Shiroishi

Shinji Kawabuchi

Masaaki Hiraki

A first oxide semiconductor layer of a pixel TFT has a first structure in which a first source electrode and a first drain electrode have, at both end portions thereof, two types of reduction action regions formed by the first oxide semiconductor layer protruding outward in a channel width direction of a first channel portion from both the first source electrode and the first drain electrode. A second oxide semiconductor layer of a drive circuit TFT has a second structure formed without protruding outward in a channel width direction of a second channel portion from a second source electrode and a second drain electrode. A protective insulation film is provided to cover the first oxide semiconductor layer, the first source electrode, and the first drain electrode.

Thin film transistor substrate, method for manufacturing the same, and display apparatus

A channel layer is formed of an oxide semiconductor. A first insulating film is provided on the channel layer, a source line, and a drain electrode, and includes a drain contact hole which reaches the drain electrode. A pixel electrode is provided on the first insulating film, includes a connection conductive layer which is connected to the drain electrode by the drain contact hole, and is formed of a transparent conductive material. The pixel electrode is covered with a second insulating film. A common electrode is provided on the second insulating film, includes an opening which faces the pixel electrode in a thickness direction, and is formed of a transparent conductive material. A metal layer, in conjunction with a part of the common electrode, forms a laminated structure, and includes a light-shield part which overlaps the channel layer at least partially in plan view.

Thin-film transistor substrate and liquid crystal display

To provide a method of manufacturing a field emission display having an improved electron emission effect by means of laser irradiation and accordingly mitigating a luminance fluctuation among pixels, and other such techniques. Provided is a method of manufacturing a field emission display which includes a cathode substrate and a fluorescent screen glass opposed to the cathode substrate and emits light when an electron emitted from a carbon nanotube printed layer () containing a carbon nanotube of the cathode electrode enters a fluorescent material of the fluorescent screen glass, the method including a laser beam irradiation step of irradiating a surface of the carbon nanotube printed layer () with a laser beam having its energy density to be spatially modulated to expose and raise the carbon nanotube of the carbon nanotube printed layer so as to form a laser irradiation part (B) and a non-laser irradiation part (C).

Manufacturing method for field emission display

A carbon body has a structure for producing a planar electron source in a simple manner; a process for producing the carbon body; and an electric field emission electron source using the carbon body. The carbon body is a thin layer having a front surface and a back surface, and at least the front surface is a continuous curved wall, as viewed in plan, having a netlike structure.

Carbon body, process for producing the carbon body, and electric field emission electron source using the carbon body

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Tokyo, Japan

Akihiko Hosono