Fei Comapny

Aiden Martin

Milos Toth

Geoff McCredie

A cold trap is provided to reduce contamination gases that react with the beam during operations that use a process gas. The cold trap is set to a temperature that condenses the contamination gas but does not condense the process gas. Cold traps may be used in the sample chamber and in the gas line.

Charged particle beam processing using process gas and cooled surface

Beam-induced etching uses a work piece maintained at a temperature near the boiling point of a precursor material, but the temperature is sufficiently high to desorb reaction byproducts. In one embodiment, NFis used as a precursor gas for electron-beam induced etching of silicon at a temperature below room temperature.

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Crows Nest, Australia

Aiden Martin