Motorola Corporation

Ai Koh

Terry Grant Sparks

David G Farber

Michael J Hartig

Jeffrey D Rose

Danny R Babbitt

Jason A Rivers

A process for forming a semiconductor device includes placing a substrate (,) into an apparatus (,), creating a plasma, and processing the substrate (,). The apparatus (,) includes an electromagnetic source (,), a bulk material (,), and a first barrier layer (,). The bulk material (,) is between the electromagnetic source (,) and an interior (,) of the apparatus (,). The first barrier layer (,) is between the bulk material (,) and the interior (,). A process for operating an apparatus (,) includes forming a polymer layer along an inorganic layer (,or,), wherein the polymer layer is formed within the apparatus (,); removing the polymer layer to expose the inorganic layer (,, or,); and etching at least a portion of the exposed inorganic layer (,, or,). Typically, the inorganic layer (,, or,) is semiconductive or resistive.

Growing community of inventors

Cedar Park, TX, United States of America

Ai Koh