Taiwan Semiconductor Manufacturing Comp. Ltd.

Ai-Jay Ma

Ching-Yueh Chen

Ming-Wei Chen

Chung-Hao Chang

In a method of manufacturing a semiconductor device, in an EUV scanner, an EUV lithography operation using an EUV mask is performed on a photo resist layer formed over a semiconductor substrate. After the EUV lithography operation, the EUV mask is unloaded from a mask stage of the EUV scanner. The EUV mask is placed under a reduced pressure below an atmospheric pressure. The EUV mask is heated under the reduced pressure at a first temperature in a range from 100° C. to 350 C°. After the heating, the EUV mask is stored in a mask stocker.

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Taoyuan County, Taiwan

Ai-Jay Ma