Kabushiki Kaisha Toshiba

Toshiba Memory Corporation

Ai Furubayashi

Takaki Hashimoto

Nobuhiro Komine

Takashi Obara

According to one embodiment, in a measurement apparatus, a controller acquires a first signal waveform, a second signal waveform, and a third signal waveform. Among mdiffraction light and &#xb1;ndiffraction light, the first signal waveform is related to spatial distribution of light intensity about first interference light by interference of the &#xb1;ndiffraction light. The second signal waveform is related to spatial distribution of light intensity about second interference light by interference of the mdiffraction light and the +ndiffraction light. The third signal waveform is related to spatial distribution of light intensity about third interference light by interference of the mdiffraction light and the &#x2212;ndiffraction light. The controller calculates a measurement error component based on a phase difference between the second signal waveform and the third signal waveform. The controller corrects the first signal waveform with using the calculated measurement error component.

Measurement apparatus, exposure apparatus, measurement method, and recording medium

According to one embodiment, there is provided a mask set including a first mask and a second mask. The first mask includes a first device pattern and a first mark pattern. The first mark pattern is used for an inspection of a position of the first device pattern on a surface of the first mask. The second mask is used to perform multiple exposure on a substrate together with the first mask. The second mask includes a second device pattern and a second mark pattern. The second mark pattern is used for an inspection of a position of the second device pattern on a surface of the second mask. The second mark pattern includes a pattern corresponding to a pattern obtained by inverting the first mark pattern.

Growing community of inventors

Yokohama, Japan

Ai Furubayashi