Air Products and Chemicals, Inc.

Versum Materials US, LLC

Agnes Derecskei-Kovacs

Manchao Xiao

Ronald Martin Pearlstein

Xinjian Lei

Mark Leonard O'Neill

Xiaobo Shi

Bing Han

Haripin Chandra

Richard Ho

Wayne Thomas McDermott

Wen Dar Liu

Yi-Chia Lee

Heather Regina Bowen

Laura M Matz

Seiji Inaoka

Sai-Hong Andrew Lo

Blake J Lew

Rung-Je Yang

Chris Keh-Yeuan Li

Chad Chang-Tse Hsieh

Philip E Behm

Mark Leonard O'neill

Ming-Shih Tsai

Pao Chia Pan

Xiao Manchao

There are provided metal corrosion inhibition cleaning compositions, methods and system for copper (Cu), tungsten (W), titanium (Ti), tantalum (Ta), cobalt (Co), and aluminum (Al). The metal corrosion inhibition cleaning compositions provide corrosion inhibition effects by use a combination of two chemicals&#x2014;at least one multi-functional amine that has more than one amino groups; and at least one multi-functional acid that has more than one carboxylate groups. The metal corrosion inhibition cleaning compositions are effective for cleaning the residues deriving from high density plasma etching followed by ashing with oxygen containing plasmas; and slurry particles and residues remaining after chemical mechanical polishing (CMP).

Copper corrosion inhibition system

Described herein are organoaminosilane precursors which can be used to deposit silicon containing films which contain silicon and methods for making these precursors. Also disclosed herein are deposition methods for making silicon-containing films or silicon containing films using the organoaminosilane precursors described herein. Also disclosed herein are the vessels that comprise the organoaminosilane precursors or a composition thereof that can be used, for example, to deliver the precursor to a reactor in order to deposit a silicon-containing film.

Organoaminosilane precursors and methods for making and using same

Described herein are precursors and methods of forming films. In one aspect, there is provided a precursor having Formula I:XRHSi(NRR)&#x2003;&#x2003;Iwherein X is selected from Cl, Br, I; Ris selected from linear or branched C-Calkyl group, a C-Calkenyl group, a C-Calkynyl group, a C-Ccyclic alkyl, and a C-Caryl group; Ris selected from a linear or branched C-Calkyl, a C-Calkenyl group, a C-Calkynyl group, a C-Ccyclic alkyl group, and a C-Caryl group; Ris selected from a branched C-Calkyl group, a C-Calkenyl group, a C-Calkynyl group, a C-Ccyclic alkyl group, and a C-Caryl group; m is 1 or 2; n is 0, 1, or 2; p is 0, 1 or 2; and m+n+p is less than 4, wherein Rand Rare linked or not linked to form a ring.

Halogenated organoaminosilane precursors and methods for depositing films comprising same

The present invention is a container and a processing for passivating the internal surface of the container to store monochlorosilane in a stable manner without degradation of the monochlorosilane. Various container surface modifications have been identified to reduce surface reactions to acceptable levels. Some of the described surface modifications result in significant reduction in monochlorosilane instability.

Cylinder surface treated container for monochlorosilane

Growing community of inventors

Macungie, PA, United States of America

Agnes Derecskei-Kovacs