U.S. Philips Corporation

Adrianus Van Der Pal

Jan Van Eijk

Johannes M Van Kimmenade

Gerard Van Engelen

Frank B Sperling

Cornelis D Van Dijk

Henricus W Janssen

Adianus G Bouwer

Positioning device with a reference frame for a measuring system, and a

A positioning device (21, 31) with a drive unit (147, 149, 151; 69, 71) with which an object table (1, 5) is displaceable over a guide (141, 65) which is fastened to a frame (45) of the positioning device (21, 31). The positioning device (21, 31) includes a force actuator system (205) which exerts on the frame (45) a compensation force which has a moment about a reference point (P) of the frame (45) whose value is equal to a value of a moment of a force of gravity acting on the object table (1, 5) about the reference point (P), and whose direction is opposed to a direction of the moment of said force of gravity. The use of the force actuator system (205) prevents the frame (45) from vibrating or being elastically deformed when a point of application on the frame (45) of the force of gravity is displaced relative to the frame (45) during a displacement of the object table (1,5). The accuracy with which the object table (1, 5) can be positioned relative to the guide (141, 65) by the drive unit (147, 149, 151; 69, 71) is accordingly not adversely affected by such vibrations or deformations. The positioning device (21, 31) is used in a lithographic device for the manufacture of integrated semiconductor circuits. The lithographic device includes a first positioning device (21) with which a substrate holder (1) is displaceable relative to a focusing system (3), and a second positioning device (31) with which a mask holder (5) is displaceable relative to the focusing system (3). A special embodiment of a lithographic device includes a joint force actuator system (205) for the first positioning device (21) and the second positioning device (31), by which system displacements of the centers, of gravity of both the substrate holder (1) and the mask holder (5) can be compensated. The force actuator system has three force actuators (205) which are integrated with three dynamic isolators (51) with which a machine frame (45) of the lithographic device rests on a base (39).

Positioning device with a force actuator system for compensating

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Eindhoven, Netherlands

Adrianus Van Der Pal