Asml Netherlands B.v.

Adrianus Marinus Verdonck

Sjoerd Nicolaas Lambertus Donders

Nicolaas Ten Kate

Michel Riepen

Theodorus Petrus Maria Cadee

Erik Henricus Egidius Catharina Eummelen

Nina Vladimirovna Dziomkina

Cornelius Maria Rops

Rogier Hendrikus Magdalena Cortie

Laurentius Johannes Adrianus Van Bokhoven

David Bessems

Takeshi Kaneko

Fabrizio Evangelista

Sandra Van Der Graaf

Benjamin Joseph De Smet

A method of thermally conditioning a physical object, includes guiding a two-phase cooling medium through a cooling duct of the physical object, wherein the guiding includes: guiding the two-phase cooling medium in a liquid phase via a pre-heating duct of the physical object from a supply side of the physical object at least partly towards a discharging side of the physical object, the two-phase cooling medium being pre-heated in the pre-heating duct; guiding the two-phase cooling medium from the pre-heating duct to a phase transitioning duct of the physical object, the two-phase cooling medium at least partly transitioning from the liquid phase towards a gas phase in the phase transitioning duct; guiding the two-phase cooling medium from the phase transitioning duct to a discharging duct of the physical object; and discharging at the discharging side the two-phase cooling medium from the discharging duct.

Thermal conditioning method

A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.

Fluid handling structure, lithographic apparatus and device manufacturing method

Growing community of inventors

Eindhoven, Netherlands

Adrianus Marinus Verdonck