Asml Netherlands B.v.

Asml Holding N.v.

Adrianus Hendrik Koevoets

Jim Vincent Overkamp

Sjoerd Nicolaas Lambertus Donders

Raymond Wilhelmus Louis Lafarre

Christiaan Alexander Hoogendam

Jacobus Cornelis Gerardus Van Der Sanden

Nicolaas Ten Kate

Michael Jozef Mathijs Renkens

Christianus Wilhelmus Johannes Berendsen

Johannes Henricus Wilhelmus Jacobs

Theodorus Petrus Maria Cadee

Martijn Houben

Rogier Hendrikus Magdalena Cortie

Antonius Franciscus Johannes De Groot

Jan Steven Christiaan Westerlaken

Sander Catharina Reinier Derks

Robertus Leonardus Tousain

Maurice Willem Jozef Etiënne Wijckmans

Martinus Agnes Willem Cuijpers

Menno Fien

Maarten Van Beijnum

Arie Jeffrey Den Boef

Hans Butler

Sander Frederik Wuister

Andre Bernardus Jeunink

Franciscus Johannes Joseph Janssen

Frits Van Der Meulen

Thibault Simon Mathieu Laurent

Marc Wilhelmus Maria Van Der Wijst

Johan Gertrudis Cornelis Kunnen

Ruud Hendrikus Martinus Johannes Bloks

Tammo Uitterdijk

Leon Martin Levasier

Siegfried Alexander Tromp

Michael L Nelson

Koos Van Berkel

Robertus Johannes Marinus De Jongh

Hendrikus Herman Marie Cox

Alain Louis Claude Leroux

Patricius Jacobus Neefs

Michael Andrew Chieda

Geoffrey O'Connor

Putra Saputra

Erik Johan Arlemark

Michael Johannes Hendrika Wilhelmina Renders

Ronald Petrus Hendricus Faassen

Erik Roelof Loopstra

Vadim Yevgenyevich Banine

Bob Streefkerk

Harmeet Singh

Engelbertus Antonius Fransiscus Van Der Pasch

Johan Frederik Dijksman

Yvonne Wendela Kruijt-Stegeman

Koen Jacobus Johannes Maria Zaal

Jan Bernard Plechelmus Van Schoot

Harmen Klaas Van Der Schoot

Marcel Beckers

Andrey Alexandrovich Nikipelov

Emiel Jozef Melanie Eussen

David Ferdinand Vles

Gosse Charles De Vries

Maxim Aleksandrovich Nasalevich

Paulus Albertus Van Hal

Robbert Edgar Van Leeuwen

Willem Herman Gertruda Anna Koenen

Carolus Johannes Catharina Schoormans

Gerard Van Schothorst

Henricus Jozef Castelijns

Paul Corné Henri De Wit

Christiaan Louis Valentin

Catharinus De Schiffart

Johannes Adrianus Cornelis Maria Pijnenburg

Wilfred Edward Endendijk

Stan Henricus Van Der Meulen

Hubertus Antonius Geraets

Van Vuong Vy

Peter Schaap

Dries Vaast Paul Hemschoote

Ronald Cornelis Gerardus Gijzen

Patrick Willem Paul Limpens

Jan Groenewold

Joost De Hoogh

Jacobus Cornelius Gerardus Van Der Sanden

Daniel Elza Roeland Audenaerdt

Cornelis Adrianus De Meijere

Willem Michiel De Rapper

Beatriz Seoane De La Cuesta

Paul Comé Henri De Wit

Evert Auke Rinze Westerhuis

A substrate with a backside surface configured to provide a friction switch when the substrate is loaded onto a substrate holder in a substrate-loading cycle, wherein the substrate backside surface has a molecular assembly including at least one high-interaction region and at least one low-interaction region. Further, there is provided methods using such a substrate and methods for creating such a substrate.

Lithography apparatus

A lithographic apparatuscomprisingincludesan object tablewhich carries an object. The lithographic apparatus may furthercomprise at least oneinclude asensoras part of a measurement systemto measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimatetheadeformation oftheanobject due toavaryingloadsloadduring operation of the lithographic apparatus, for exampleavaryingloadsloadinduced by a two-phase flow in a channel formedwithinofthe object table.Additionally, or alternatively, theThelithographic apparatuscomprisesmay includea predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used toprovide apatterna substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.

Lithographic apparatus and an object positioning system

A lithographic apparatus includes a clamp () configured to receive an object (). The clamp defines at least one channel () configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck () coupled to the clamp. The chuck () defines at least one void () configured to thermally insulate the chuck from the clamp.

Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.

Cooling apparatus and plasma-cleaning station for cooling apparatus

A reflector for EUV radiation, the reflector comprising a reflector substrate and a reflective surface, the reflector substrate having a plurality of coolant channels formed therein, the coolant channels being substantially straight, substantially parallel to each other and substantially parallel to the reflective surface and configured so that coolant flows in parallel through the coolant channels and in contact with the reflector substrate.

Multilayer reflector, method of manufacturing a multilayer reflector and lithographic apparatus

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Lithographic apparatus

A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

Support apparatus, lithographic apparatus and device manufacturing method

An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.

Imprint lithography apparatus and method

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus () for cooling the substrate, wherein the cooling apparatus comprises a cooling element () located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.

A lithographic apparatus comprising: a channel () for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (); a second material () between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material () between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.

Lithographic apparatus and method of manufacturing a lithographic apparatus

A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.

Method for compensating for an exposure error, a device manufacturing method, a substrate table, a lithographic apparatus, a control system, a method for measuring reflectivity and a method for measuring a dose of EUV radiation

Growing community of inventors

Mierlo, Netherlands

Adrianus Hendrik Koevoets