Asml Netherlands B.v.

Adrianus Fransiscus Petrus Engelen

Johannes Catharinus Hubertus Mulkens

Jen-Shiang Wang

Henricus Johannes Lambertus Megens

Robert Kazinczi

A method of controlling a lithographic apparatus, the method including setting an illumination system of the lithographic apparatus to effect a selected illumination mode, measuring a value of a first parameter of the lithographic apparatus, calculating a value of a second parameter of a projected image of a feature of a test pattern having a plurality of features using a model of the lithographic apparatus and the measured value of the first parameter, and controlling the lithographic apparatus with reference to the calculated value of the second parameter.

Method of controlling a lithographic apparatus, device manufacturing method, lithographic apparatus, computer program product and method of improving a mathematical model of a lithographic process

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Waalre, Netherlands

Adrianus Fransiscus Petrus Engelen