Infineon Technologies Ag

Infineon Technologies Austria Ag

Infineon Technologies Dresden Gmbh & Co . Kg

Adrian Finney

Andrei Cobzaru

Bogdan-Eugen Matei

Oliver Blank

Stefan Tegen

Thomas Krotscheck Ostermann

Norbert Krischke

Dietmar Kotz

Alessandro Ferrara

Radu Eugen Cazimirovici

Dorin Ioan Mohai

Rolf Weis

Gerhard Prechtl

Dirk Ahlers

Oliver Häberlen

Luca Petruzzi

Ulrich Glaser

Paolo Del Croce

Andrew Wood

Matthias Kroenke

Harsh Naik

Ingmar Neumann

Michael Mayerhofer

Gerhard Nöbauer

Cristian Mihai Boianceanu

Marius Aurel Bodea

Ilie-Ionut Cristea

Markus Mergens

Mathias Racki

Adrian Apostol

Christoph Kubasch

Joachim Schönle

Andrei V Danchiv

Gilles Guerrero

An electronic circuit and a method are disclosed. The electronic circuit includes: a first transistor device having a load path between a first load path node and a second load path node; and a clamping circuit connected to the load path of the first transistor device. The clamping circuit includes: a second transistor device having a load path connected in parallel with the load path of the first transistor device, and a control node; and a drive circuit configured to drive the second transistor device. The drive circuit includes a clamping element and a resistor connected in series between the first and second load path nodes of the first transistor device. The drive circuit is configured to drive the second transistor device dependent on a voltage across the resistor. The first transistor device and the clamping circuit are integrated in a same semiconductor die.

Electronic circuit with a transistor device and a clamp circuit and method

The application relates to a semiconductor die including a device in an active area of the die. The device includes a field electrode region formed in a field electrode trench extending vertically into a semiconductor body. The field electrode region includes a first and a second field electrode stacked vertically above each other in the field electrode trench. An edge termination structure laterally between the active area and a lateral edge region of the die includes a first and a second shield electrode arranged laterally consecutive between the active area and the lateral edge region to stepwise decrease an electrical potential between the edge region and the active area.

Semiconductor die including an edge termination structure laterally between an active area and a lateral edge region of the die

A semiconductor device includes: a semiconductor substrate; a drift zone of a first conductivity type in the semiconductor substrate; an array of interconnected gate trenches extending from a first surface of the semiconductor substrate into the drift zone; a plurality of semiconductor mesas delimited by the array of interconnected gate trenches; a plurality of needle-shaped field plate trenches extending from the first surface into the plurality of semiconductor mesas; in the plurality of semiconductor mesas, a source region of the first conductivity type and a body region of a second conductivity type separating the source region from the drift zone; and a current spreading region of the first conductivity type at the bottom of the gate trenches and having a higher average doping concentration than the drift zone. Methods of producing the semiconductor device are also described.

Semiconductor device having a current spreading region

The disclosure relates to a semiconductor die with a transistor device, which has a channel region formed in a semiconductor body, a gate region aside the channel region, for controlling a channel formation, a drift region formed in the semiconductor body, and a field electrode in a field electrode trench, which extends from a frontside of the semiconductor body vertically into the drift region, wherein an insulating layer is formed on the frontside of the semiconductor body and a frontside metallization is formed on the insulating layer, and wherein a capacitor electrode is formed in the insulating layer, which is conductively connected to at least a portion of the field electrode.

Semiconductor die with a power device and method of manufacturing the same

A semiconductor arrangement is disclosed. The semiconductor arrangement includes: a semiconductor body and a temperature sensor (TES) integrated in the semiconductor body. The TES includes: a first semiconductor region of a first doping type arranged, in a vertical direction of the semiconductor body, between a second semiconductor region of a second doping type and a third semiconductor of the second doping type, and a contact plug ohmically connecting the first semiconductor region and the second semiconductor region. The first semiconductor region includes a base region section spaced apart from the contact plug in a first lateral direction of the semiconductor body and a resistor section arranged between the base region section and the contact plug. The resistor section is implemented such that an ohmic resistance of the resistor section between the base region section and the first semiconductor region is at least 1 MΩ.

Semiconductor arrangement with an integrated temperature sensor

A transistor arrangement and an electronic circuit with a transistor arrangement are disclosed. The transistor arrangement includes: drift and drain regions arranged in a semiconductor body and connected to a drain node; at least one load transistor cell having a source region integrated in a first active region of the semiconductor body; at least one sense transistor cell having a source region integrated in a second active region of the semiconductor body; a first source node electrically coupled to the source region of the at least one load transistor cell; a second source node electrically coupled to the source region of the at least one sense transistor cell; and a compensation resistor connected between the source region of the at least one sense transistor cell and the second source node. The compensation resistor is integrated in the semiconductor body and has a resistive conductor which includes a doped semiconductor material.

Transistor arrangement with a load transistor and a sense transistor

A semiconductor device includes a guard structure located laterally between a first active area of a semiconductor substrate and a second active area of the semiconductor substrate. The guard structure includes a first doping region located at a front side surface of the semiconductor substrate, and a wiring structure electrically connecting the first doping region to a highly doped portion of a common doping region. The common doping region extends from a backside surface of the semiconductor substrate to at least a part of the front side surface of the semiconductor substrate in contact with the wiring structure of the guard structure. Corresponding methods for forming the semiconductor device are also described.

Semiconductor device with a guard structure and corresponding methods of manufacture

A semiconductor device includes a guard structure located laterally between first and second active areas of a semiconductor substrate. The guard structure includes a first doping region at a front side surface of the substrate and a wiring structure electrically connecting the first doping region to a highly doped portion of a common doping region. The common doping region extends from a backside surface of the substrate to at least a part of the front side surface in contact with the wiring structure. An edge termination doping region laterally surrounds the first and second active areas. The edge termination doping region and the first doping region have a first conductivity type, and the common doping region has a second conductivity type. A resistive connection between the edge termination doping region and the first doping region is present at least during reverse operating conditions of the semiconductor device.

Semiconductor devices and methods for forming a semiconductor device

Representative implementations of devices and techniques provide a bandgap reference voltage using at least one polysilicon diode and no silicon diodes. The polysilicon diode is comprised of three portions, a lightly doped portion flanked by a more heavily doped portion on each end.

Polysilicon diode bandgap reference

According to an embodiment of a semiconductor device, the semiconductor device includes a power device well in a semiconductor substrate, a logic device well in the substrate and spaced apart from the power device well by a separation region of the substrate, and a minority carrier conversion structure including a first doped region of a first conductivity type in the separation region, a second doped region of a second conductivity type in the separation region and a conducting layer connecting the first and second doped regions. The second doped region includes a first part interposed between the first doped region and the power device well and a second part interposed between the first doped region and the logic device well.

Minority carrier conversion structure

A semiconductor device comprises a semiconductor substrate doped with dopants of a first type and a vertical transistor composed of one or more transistor cells. Each transistor cell has a first region formed in the substrate and doped with dopants of a second type, and the first regions form first pn-junctions with the surrounding substrate. At least a first well region is formed in the substrate and doped with dopants of a second type to form a second pn-junction with the substrate. The first well region is electrically connected to the first regions of the vertical transistor via a semiconductor switch. The semiconductor device comprises a detection circuit, which is integrated in the substrate and configured to detect whether the first pn-junctions are reverse biased. The switch is opened when the first pn-junctions are reverse biased and the switch is closed when the first pn-junctions are not reverse biased.

Smart semiconductor switch

A semiconductor device comprises semiconductor substrate including vertical transistor and with dopants of a first type. Each transistor cell of transistor has body region formed in substrate and with dopants of second type. The body regions form first pn-junctions with substrate. A first well region is formed in substrate and with dopants of a second type forming a second pn-junction with substrate. Switch connects this first well region to body regions. A second well region is formed in the substrate and with dopants of a second type to form third pn-junction with substrate. Detection circuit is integrated in the second well region and to detect whether the first pn-junctions are reverse biased. The switch connects or disconnects the first well region(s) and the body regions of the transistor cell, and is opened, when the first pn-junctions are reverse biased, and closed, when the first pn-junctions are not reverse biased.

A monolithic integrated circuit includes a low-voltage control circuit, a vertical power transistor, and a source follower. The vertical power transistor includes at least a drain. The source follower includes a drain that is coupled to the drain of the vertical power transistor, a gate that is coupled to a limit voltage node, and a source that is coupled to a high impedance node. The source follower is arranged such that a source voltage at the source of the source follower is a voltage-limited version of the drain voltage of the vertical power transistor. The low-voltage control circuit includes a driver and protection circuit that is arranged to detect the source voltage, to drive the vertical power transistor, and to adjust how the vertical power transistor is biased based, at least in part, on the source voltage.

Inverse current protection circuit sensed with vertical source follower

A two-stage protection device for an electronic component protects against transient disturbances. The electronic component may be a semiconductor component, and may include one or multiple transistors and/or an integrated circuit. The protection device is connected to at least a first contact and a second contact of the electronic component, and is disposed essentially in parallel to the component that is to be protected, between the first contact and the second contact. The protection device includes a first stage with at least one diode and a second stage separated from the first stage by a resistor. The second stage includes at least one diode arrangement having two back-to-back disposed diodes which are disposed cathode-to-cathode.

ESD protection

A semiconductor device includes an epitaxial layer of semiconductor material of a first conductivity type, a body region of a second (opposite) conductivity type extending into the epitaxial layer from a main surface of the epitaxial layer, a source region of the first conductivity type disposed in the body region, and a channel region extending laterally in the body region from the source region along the main surface. A charge compensation region of the second conductivity type can be provided under the body region which extends in a direction parallel to the main surface and terminates prior to a pn-junction between the source and body regions at the main surface, and/or an additional region of the first conductivity type which has at least one peak doping concentration each of which occurs deeper in the epitaxial layer from the main surface than a peak doping concentration of the device channel region.

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Villach, Austria

Adrian Finney