Applied Materials, Inc.

Adele Mariadass

Christophe Marcadal

Martin Jeffrey Salinas

Richard Omar Collins

Masato Ishii

Songjae Lee

Ernesto J Ulloa

Martin Truemper

Yong Zheng

Anita Zhao

Henry Barandica

A plasma processing system for cleaning a substrate is provided. The plasma processing system includes a process chamber that includes: a chamber body enclosing an interior volume; and a substrate support disposed in the interior volume. The plasma processing system includes a vacuum pump; a first exhaust line fluidly coupled between the interior volume of the process chamber and the vacuum pump; and a second exhaust line fluidly coupled between the interior volume of the process chamber and the vacuum pump. The first exhaust line and the second exhaust line are arranged to provide alternative paths for the exhaust between the interior volume and the vacuum pump, and the first exhaust line has an internal diameter that is at least 50% smaller than the internal diameter of the second exhaust line.

Plasma preclean system for cluster tool

Growing community of inventors

Reno, NV, United States of America

Adele Mariadass