Asml Holding N.v.

Asml Netherlands B.v.

Adel Joobeur

Stanislav Y Smirnov

Yevgeniy Konstantinovich Shmarev

Eric Brian Catey

Lev Ryzhikov

Arun Mahadevan Venkataraman

Huibert Visser

Paul Van Der Veen

Igor Matheus Petronella Aarts

Oscar Franciscus Jozephus Noordman

Scott Douglas Coston

Jacob Fredrik Friso Klinkhamer

Tao Chen

King Pui Leung

Ronan James Havelin

Joseph Carbone

Rob Vink

Arie Jeffrey Den Boef

Harry Sewell

Hako Botma

Richard Jacobs

Mark Trentelman

David Heald

Joerg Bruebach

Oscar Noordman

A measurement apparatus, including: a tapered optical fiber, the tapered optical fiber having an input to receive radiation and having an output to provide spectrally broadened output radiation toward a measurement target, the tapered optical fiber configured to spectrally broaden the radiation received at the input; and a detector system configured to receive a redirected portion of the output radiation from the measurement target.

Broad spectrum radiation by supercontinuum generation using a tapered optical fiber

An inspection apparatus includes an illumination system that receives a first beam and produces second and third beams from the first beam and a catadioptric objective that directs the second beam to reflect from a wafer. A first sensor detects a first image created by the reflected second beam. A refractive objective directs the third beam to reflect from the wafer, and a second sensor detects a second image created by the reflected third beam. The first and second images can be used for CD measurements. The second beam can have a spectral range from about 200 nm to about 425 nm, and the third beam can have a spectral range from about 425 nm to about 850 nm. A third sensor may be provide that detects a third image created by the third beam reflected from the wafer. The third image can be used for OV measurements.

Inspection apparatus, lithographic apparatus, and device manufacturing method

Disclosed are apparatuses, methods, and lithographic systems for EUV mask inspection. An EUV mask inspection system can include an EUV illumination source, an optical system, and an image sensor. The EUV illumination source can be a standalone illumination system or integrated into the lithographic system, where the EUV illumination source can be configured to illuminate an EUV radiation beam onto a target portion of a mask. The optical system can be configured to receive at least a portion of a reflected EUV radiation beam from the target portion of the mask. Further, the image sensor can be configured to detect an aerial image corresponding to the portion of the reflected EUV radiation beam. The EUV mask inspection system can also include a data analysis device configured to analyze the aerial image for mask defects.

EUV mask inspection system

A system and method is described for correcting aberrations caused by field curvature with a catadioptric objective. In one example, a catadioptric optical system includes a first catadioptric element and a second catadioptric element. The first catadioptric element includes a first surface positioned to reflect a beam and a second surface positioned to focus the beam reflected by the first surface. The second catadioptric element is configured to receive the beam reflected by the second surface of the first catadioptric element. The second catadioptric element includes a third surface positioned to reflect the beam, and a fourth reflective surface positioned to focus the beam reflected by the third reflective surface. A curvature of the third or fourth surfaces of the second catadioptric element is chosen to apply a positive contribution to a field curvature associated with the first catadioptric element.

Catadioptric objective for scatterometry

A beam modifying unit increases both temporal pulse length and Etendue of an illumination beam. The pulse modifying unit receives an input pulse of radiation and emits one or more corresponding output pulses of radiation. A beam splitter divides the incoming pulse into a first and a second pulse portion, and directs the first pulse portion along a second optical path and the second portion along a first optical path as a portion of an output beam. The second optical path includes a divergence optical element. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, and receive the second pulse portion to redirect the second portion, such that the optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.

Pulse modifier with adjustable etendue

Disclosed are high numerical (NA) catadioptric objectives without a central obscuration, and applications thereof. Such objectives can operate through a wide spectral bandwidth of radiation, including deep ultraviolet (DUV) radiation. Importantly, refractive elements in the catadioptric objectives can be manufactured from a single type of material (such as, for example, CaFand/or fused silica). In addition, the elements of such catadioptric objectives are rotationally symmetric about an optical axis. The catadioptric objectives eliminate the central obscuration by (1) using a polarized beamsplitter (which passes radiation of a first polarization and reflects radiation of a second polarization), and/or (2) using one or more folding mirrors to direct off-axis radiation into the pupil of the catadioptric objective. An example catadioptric objective is shown in FIG.

High numerical aperture catadioptric objectives without obscuration and applications thereof

A coherence remover is provided. In an embodiment the coherence remover includes a first mirror and a second mirror coupled to the first mirror. The coherence remover is configured to receive an input beam. Each of the first and second mirrors is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam.

Illumination system coherence remover with two sets of stepped mirrors

A coherence remover includes a first partially reflective surface and a second partially reflective surface. The coherence remover is configured to receive an input beam. Each of the first and second reflective surfaces is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam.

Illumination system coherence remover with a series of partially reflective surfaces

A scatterometer has a radiation source capable of emitting radiation in distinct first and second wavelength ranges. An adjustable optical element is provided to effect a chromatic correction as necessary according to which wavelength range is in use. A single scatterometer can thereby effect measurements using widely separated wavelengths.

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

A pulse modifying unit is provided in the illumination system of the lithographic apparatus to reduce the degradation of the expensive lens elements by billions of the high intensity ultraviolet pulses from the laser is configured to receive an input pulse of radiation along a first optical axis and further configured to emit one or more corresponding output pulses of radiation along a second optical axis, including a divider disposed along the first optical axis and configured to divide the incoming pulse into a first and a second pulse portion, wherein the divider is further configured to direct the first pulse portion along the second optical axis. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, configured to receive the second pulse portion and to redirect the second portion along the second optical axis. The optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.

Growing community of inventors

Milford, CT, United States of America

Adel Joobeur