Intel Corporation

Tahoe Research, Ltd.

Santa Clara

Adel A Elsherbini

Johanna M Swan

Shawna M Liff

Feras Eid

Aleksandar Aleksov

Georgios C Dogiamis

Telesphor Kamgaing

Sasha N Oster

Henning Braunisch

Krishna Bharath

Gerald S Pasdast

Arun Chandrasekhar

Veronica Aleman Strong

Brandon M Rawlings

Kimin Jun

Thomas L Sounart

Valluri Ramana Rao

James S Clarke

Mathew J Manusharow

Richard J Dischler

Patrick R Morrow

William J Lambert

Vijay K Nair

Javier Soto Gonzalez

Javier A Falcon

Beomseok Choi

Jeanette M Roberts

Roman Caudillo

Yidnekachew S Mekonnen

Brennen Karl Mueller

Van H Le

Han Wui Then

Kaladhar Radhakrishnan

Amit S Baxi

Braxton L Lathrop

Vincent S Mageshkumar

Ravi Pillarisetty

Robert L Sankman

Stephen L Morein

Paul B Fischer

John Stephen Guzek

Nicole K Thomas

Hubert C George

Zhichao Zhang

David J Michalak

Zachary R Yoscovits

Joshua Heppner

Kristof Darmawikarta

Robert Alan May

Ravindranath Vithal Mahajan

Nitin A Deshpande

Zhiguo Qian

Sri Ranga Sai Boyapati

Yoshihiro Tomita

Lester Lampert

Suddhasattwa Nad

Jimin Yao

Mauro J Kobrinsky

Fay Hua

Kanwaljit Singh

Julien Sebot

Kemal Aygun

Lakshman Krishnamurthy

Mihir K Roy

Vivek Raghunathan

Kenneth D Shoemaker

Gaurav Chawla

Kevin P O'brien

Robert S Chau

Gilbert W Dewey

Marko Radosavljevic

Debendra Das Sharma

Bernhard Raaf

Dmitri E Nikonov

Debendra Mallik

Srinivas V Pietambaram

Min Huang

Tanay Karnik

Kevin O'Brien

Omkar G Karhade

Randy B Osborne

Pooya Tadayon

Chuan Hu

Wilfred Gomes

Zuoguo Wu

Stefano Pellerano

James Chris Matayabas, Jr

Yonggang Li

Dilan Seneviratne

Ravi V Mahajan

Srikant Nekkanty

David Johnston

Sriram Srinivasan

Rachael Jade Parker

Emanuel Cohen

Neelam Chandwani

Hyung-Jin Lee

Christopher Schaef

Robert J Munoz

Charles A Gealer

Apparatus and methods of manufacture are disclosed. In one example the apparatus includes a first substrate that has a first surface, a first optical waveguide that is at or near the first surface of the first substrate, a second substrate that has a second surface. The second substrate is coupled to the first substrate at an interface. The apparatus also has a photonic integrated circuit (PIC) with a portion at or near the second surface. The PIC is in alignment with and optically coupled to the first optical waveguide across the interface.

Apparatus and method of manufacturing a vertically disaggregated photonic device

Technologies for cooling conformal power delivery structures are disclosed. In one embodiment, an integrated circuit component has a die with a backside power plane mated to it. A lid of the integrated circuit component is mated with the backside power plane, forming a sealed cavity. The lid has an inlet and an outlet, and a channel is defined in the lid for liquid coolant to flow from the inlet, across the backside power plane, and to the outlet. The liquid coolant directly contacts the backside power plane, efficiently removing heat from the backside power plane.

Cooling of conformal power delivery structures

A microelectronic assembly is provided comprising: a first plurality of integrated circuit (IC) dies in a first layer; a second plurality of IC dies in a second layer between the first layer and a third layer; and a third plurality of IC dies in the third layer. In some embodiments, the second plurality of IC dies comprises IC dies in an array of rows and columns, each IC die of the second plurality of IC dies is coupled to more than one IC die of the first plurality of IC dies, and the third plurality of IC dies is to provide electrical coupling between adjacent ones of the second plurality of IC dies.

Fine-grained disaggregated server architecture

Methods and apparatus for inductor and transformer semiconductor devices using hybrid bonding technology are disclosed. An example semiconductor device includes a first standoff substrate; a second standoff substrate adjacent the first standoff substrate; and a conductive layer adjacent at least one of the first standoff substrate or the second standoff substrate.

Inductor and transformer semiconductor devices using hybrid bonding technology

A microelectronic assembly is provided comprising: a first IC die in a first layer comprising an array of radio frequency (RF) patch antennas on a side opposite to a second layer; a second IC die in the second layer between the first layer and a third layer; and a third IC die in the third layer. The first IC die comprises RF and analog circuitry, the first IC die is part of an array of IC dies having similar size and circuitry as the first IC die, the second layer and the third layer comprise a dielectric with through-dielectric vias (TDVs) therein surrounding the second IC die and the third IC die, respectively, and an interface between adjacent layers comprises interconnects having a pitch of 10 micrometers between adjacent interconnects.

Packaging architectures for sub-terahertz radio frequency devices

Techniques and mechanisms for mitigating stress on hybrid bonded interfaces in a multi-tier arrangement of integrated circuit (IC) dies. In an embodiment, first dies are bonded at a host die each via a respective one of first hybrid bond interfaces, wherein a second one or more dies are coupled to the host die each via a respective one of the first dies, and via a respective second hybrid bond interface. Stress at one of the hybrid bond interfaces is mitigated by properties of a first dielectric layer that extends to that hybrid bond interface. In another embodiment, stress at a given one of the hybrid bond interfaces is mitigated by properties of a dummy chip—or alternatively, properties of a patterned encapsulation structure—which is formed on the given hybrid bond interface.

Device, method and system to mitigate stress on hybrid bonds in a multi-tier arrangement of chiplets

Technologies for high throughput additive manufacturing (HTAM) structures are disclosed. In one embodiment, a sacrificial dielectric is formed to provide a negative mask on which to pattern a conductive trace using HTAM. In another embodiment, a permanent dielectric is patterned using a processing such as laser project patterning. A conductive trace can then be patterned using HTAM. In yet another embodiment, conductive traces with tapered sidewalls can be patterned, and then a buffer layer and HTAM layer can be deposited on top.

High throughput additive manufacturing for integrated circuit components containing traces with feature size and grain boundaries

Technologies for high throughput additive manufacturing for integrated circuit components

Microelectronic assemblies, and related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a first microelectronic component, embedded in a first dielectric layer, including a surface and one or more side surfaces at least partially encapsulated by a first magnetic conductive material; and a second microelectronic component, embedded in a second dielectric layer on the first dielectric layer, including a surface and one or more side surfaces at least partially encapsulated by a second magnetic conductive material, wherein the second microelectronic component is coupled to the surface of the first microelectronic component by a hybrid bonding region, and wherein the second magnetic conductive material is coupled to the first magnetic conductive material.

Contiguous shield structures in microelectronic assemblies having hybrid bonding

An integrated circuit (IC) device structure, comprising a host chip having a device layer and one or more first metallization levels over adjacent first and second regions of the device layer. The first metallization levels are interconnected to the device layer. An interconnect chiplet is over the first metallization levels within the first region. The interconnect chiplet comprises a plurality of second metallization levels, and a plurality of third metallization levels over the first metallization levels within the second region and adjacent to the interconnect chiplet. At least one of an interconnect feature dimension or composition differs between one of the second metallization levels and an adjacent one of the third metallization levels.

Selective interconnects in back-end-of-line metallization stacks of integrated circuitry

Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a first die, having a first surface and an opposing second surface, in a first layer, and including a first metallization stack at the first surface; a device layer on the first metallization stack; a second metallization stack on the device layer; and an interconnect on the first surface of the die electrically coupled to the first metallization stack; a conductive pillar in the first layer; and a second die, having a first surface and an opposing second surface, in a second layer on the first layer, wherein the first surface of the second die is coupled to the conductive pillar and to the second surface of the first die by a hybrid bonding region.

Microelectronic assemblies having backside die-to-package interconnects

Microelectronic assemblies, and related devices and methods, are disclosed herein. For example, in some embodiments, a microelectronic assembly may include a package substrate having a first surface and an opposing second surface, and a die secured to the package substrate, wherein the die has a first surface and an opposing second surface, the die has first conductive contacts at the first surface and second conductive contacts at the second surface, and the first conductive contacts are coupled to conductive pathways in the package substrate by first non-solder interconnects.

Microelectronic assemblies

Embodiments of the present disclosure provide a microelectronic assembly comprising: an integrated circuit (IC) die in a first layer and a plurality of IC dies in a second layer, at least two adjacent IC dies in the plurality being electrically coupled along their proximate edges by the IC die. The first layer and the second layer are electrically and mechanically coupled by interconnects having a pitch of less than 10 micrometers between adjacent interconnects, and the IC die comprises capacitors and voltage regulator circuitry.

Power delivery through capacitor-dies in a multi-layered microelectronic assembly

Disclosed herein are microelectronic assemblies including direct bonding, as well as related structures and techniques. For example, in some embodiments, a microelectronic assembly may include a first microelectronic component and a second microelectronic component coupled to the first microelectronic component by a direct bonding region including metal contacts that are distributed non-uniformly. In some embodiments, a microelectronic assembly may include a first microelectronic component and a second microelectronic component coupled to the first microelectronic component by a direct bonding region, wherein the direct bonding region includes a first metal contact and a second metal contact, the first metal contact has a larger area than the second metal contact.

Direct bonding in microelectronic assemblies

Techniques and mechanisms for high interconnect density communication with an interposer. In some embodiments, an interposer comprises a substrate and portions disposed thereon, wherein respective inorganic dielectrics of said portions adjoin each other at a material interface, which extends to each of the substrate and a first side of the interposer. A first hardware interface of the interposer spans the material interface at the first side, wherein a first one of said portions comprises first interconnects which couple the first hardware interface to a second hardware interface at the first side. A second one of said portions includes second interconnects which couple one of first hardware interface or the second hardware interface to a third hardware interface at another side of the interposer. In another embodiment, a metallization pitch feature of the first hardware interface is smaller than a corresponding metallization pitch feature of the second hardware interface.

Composite interposer structure and method of providing same

Growing community of inventors

Tempe, AZ, United States of America

Adel A Elsherbini