Matheson Tri-gas, Inc.

Adam Seymour

Mark Raynor

Daniel Tempel

Larry Wagg

Junpin Yao

Robert Torres, Jr

Glenn Mitchell

The present invention relates, in general, to the purification of boron trichloride (BCl). More particularly, the invention relates to a process for minimizing silicon tetrachloride (SiCl) formation in BClproduction and/or the removal of SiClin BClproduct stream by preventing/minimizing the silicon source in the reaction chambers. In addition, a hydride material may be used to convert any SiClpresent to SiHwhich is easier to remove. Lastly freeze separation would replace fractional distillation to remove SiClfrom BClthat has been partially purified to remove light boilers.

Reduction of SiCl4 in the presence of BCl3

Methods of cleaning a processing chamber with nitrogen trifluoride (NF) are described. The methods involve a concurrent introduction of nitrogen trifluoride and a reactive diluent into the chamber. The NFmay be excited in a plasma inside the chamber or in a remote plasma region upstream from the chamber. The reactive diluent may be introduced upstream or downstream of the remote plasma such that both NFand the reactive diluent (and any plasma-generated effluents) are present in the chamber during cleaning. The presence of the reactive diluent enhances the chamber-cleaning effectiveness of the NF.

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Longmont, CO, United States of America

Adam Seymour