Spts Technologies Limited

Adam S Beachey

Weikang Fan

A method of plasma etching an indium-containing compound semiconductor substrate and plasma etch apparatus for plasma etching an indium-containing semiconductor substrate can use a primary plasma etching process and a secondary plasma etching process. The primary plasma etching process uses a halogen-containing component and a nitrogen-containing component. The secondary plasma etching process uses an oxygen-containing component.

Growing community of inventors

Newport, United Kingdom

Adam S Beachey