Asml Us, Inc.

Silicon Valley Group, Thermal Systems Llp

Semiconductor Equipment Group, LLC

Aviza Technology Limited

Adam Q Miller

Daniel M Dobkin

Daniel Dobkin

A chemical vapor deposition (CVD) apparatus is provided. The CVD apparatus comprises a deposition chamber and a main chamber. The deposition chamber comprises at least one single injector and one or more exhaust channels. The main chamber supports the deposition chamber and includes at least one gas inlet to inject at least one gas into the main chamber. The gases are removed through the exhaust channels, thereby creating an inwardly flowing purge which acts to isolate the deposition chamber. At least one semi-seal is formed between the deposition chamber and the substrate which acts to confine reactive chemicals within each deposition region.

Single body injector and deposition chamber

A deposition chamber for delivering gases to a substrate or wafer for processing of said substrate or wafer is provided. The injector is provided comprising an elongated member with end surfaces and at least one gas delivery surface extending along the length of the member and which includes a number of first elongated passages formed therein for received a gas. Also formed within the member are a number of thin distribution channels which extend between the first elongated passages and the gas delivery surface. In another embodiment, the injector further includes at least one second elongated passage formed therein for receiving an etchant species. Metering tubes may be inserted into each elongated passage and are spaced from the walls of said passages and extend between the ends. The deposition chamber includes at least one injector as described above; a plurality of vent blocks having end surfaces and at least one elongated external surface extending along the length of each of the vent blocks; and a support positioned beneath the injector and vent blocks, creating a deposition region there between. The vent blocks are positioned adjacent one on each side of the injector, and spaced from the injector to define exhaust channels there between for removing the gas.

A single body injector for delivering gases to a surface is provided. The injector is comprised of an elongated member with end surfaces and at least one gas delivery surface extending along the length of the member and which includes a number of elongated passages formed therein. Also formed within the member are a number of thin distribution channels which extend between the elongated passages and the gas delivery surface. In another embodiment of the invention a number of metering tubes may be inserted into each elongated passage and are spaced from the walls of the passages and extend between the ends. Gases are conveyed to the elongated passages, through the distribution channels to the gas delivery surface where they are directed to a desired region where they mix, react and form a uniform thin film on the substrate positioned beneath the injector. The gas delivery surface is comprised of rounded side regions and a center recessed region in which instance the thin distribution channels extend between the first elongated passages and the center recessed region of the gas delivery surface. In another embodiment, the injector further contains an elongated passage for receiving an etchant species. The etchant species is conveyed to the gas delivery surface via a distribution channel which extends between the elongated passage and the rounded side regions of the gas delivery surface. The etchant species is distributed along the gas delivery surface where it removes deposited materials along the gas delivery surface and other surfaces within the chamber.

Growing community of inventors

Felton, CA, United States of America

Adam Q Miller