Veeco Instruments Inc.

Adam F Bertuch

Michael J Sershen

Michael W Pacier

Laurent Lecordier

Ramesh Prasad Manchaladore Narahari Rao

Thousif Ahamad Khan Hosakote Buden

Fully automated batch production thin film deposition systems configured to deliver uniformity combined with high throughput at a low cost-per-wafer. In some examples, systems of the present disclosure include automated safe wafer handling via low-impact batch transfer via transportable wafer racks loaded with a plurality of wafers. In some examples, systems include a modular pre-heat & cool-down architecture that enables a flexible thermal management solution tailored around particular specifications.

Automated batch production thin film deposition systems and methods of using the same

Transportable semiconductor wafer rack

A chuck system for performing a substrate-biased atomic layer deposition process that forms an electrically conductive film on a substrate includes an electrically conductive substrate holder configured to support the substrate and an electrically conductive base that supports the substrate holder. An electrical isolating layer is sandwiched between the substrate holder and the base. The electrical isolating layer has an outer end and an edge recess formed in and that runs around the outer edge. The edge recess is configured to prevent the electrically conductive film from coating the entire interior of the edge recess, thereby maintaining electrical isolation between the substrate holder and the base.

Chuck systems and methods having enhanced electrical isolation for substrate-biased ALD

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South Hamilton, MA, United States of America

Adam F Bertuch