Applied Materials Israel Limited

Adam Baer

Haim Feldman

Boris Golberg

Roman Naidis

Boris Morgenstein

Ditza Auerbach

Amir Moshe Sagiv

Jimmy Vishnipolsky

Mariano Abramson

Yuri Belenky

Chaim Braude

Uriel Malul

An on-tool measurement system and a method for measuring optical system's wavefront (WF) aberrations are disclosed. The on-tool measurement system includes an optical setup comprising a moveable deflection element further comprising a highly transparent region. The deflection element includes a first surface configured to project a first image of at least one object onto a sensor and the highly transparent region includes a second surface configured to project a second image of the at least one object onto the sensor. The on-tool measurement system includes a sensor configured to capture the first and second images and a controller configured to measure differential displacements between the first and second images at each deflection element position and to calculate the optical setup local WF gradients that depend on the measured differential displacements.

On-tool wavefront aberrations measurement system and method

An inspection system includes a first focusing unit configured to perform fast focus changes to a first focusing function applied to an incident light beam. A traveling lens acousto-optic device is arranged to receive the light beam focused by the first focusing function and produce focused spots using a plurality of traveling lenses generated in response to radio frequency signals. The traveling lenses apply a second focusing function and the traveling lens acousto-optic device is arranged to alter the second focusing function at a fast rate. The inspection system also includes optics arranged to direct the focused spots onto an inspected object and to direct radiation from the inspected object to a sensor.

Inspection system and method for fast changes of focus

A system that includes: (a) a mask manipulator, that is arranged to: receive an opaque EUV pod that encloses an EUV mask, extract, in a highly clean environment, the EUV mask from the outer pod and the inner pod of the EUV pod, and cover an upper face of the EUV mask with protective cover that is at least partially transparent to DUV radiation; (b) a scanner, arranged to scan the EUV mask, using DUV illumination while maintaining in the scanner an environment that has a cleanliness level that is below a tolerable EUV mask cleanliness level; and (c) a transport system arranged to transport the EUV mask and the protective cover between the scanner and the mask manipulator.

Inspection of EUV masks by a DUV mask inspection tool

Apparatus for inspection of a surface, the apparatus including an objective having central and peripheral regions, which is positioned to focus an input beam through the central region in a normal direction onto the surface. The apparatus further includes a first periscope which is positionable to divert the input beam so as to pass through the peripheral region of the objective, whereby the objective focuses the input beam in an oblique direction onto the surface. There is also a second periscope which is positionable to capture radiation reflected from the surface in the oblique direction after passage of the reflected radiation through the peripheral region of the objective.

System for inspecting a surface employing configurable multi angle illumination modes

Apparatus for inspection of a surface, including irradiating optics which are adapted to irradiate the surface with an irradiating beam having an adjustable polarization. The apparatus further includes at least one detector, each detector being associated with a respective analyzer having an orientation and adapted to generate signals in response to light received via the analyzer from an irradiated area on the surface, one of the at least one detector being adapted to receive scattered light from the irradiated area. The apparatus also includes a controller which is adapted to direct the irradiating optics to irradiate the irradiated area and which, in response to calibration signals generated thereby at the at least one detector, is adapted to set the adjustable polarization and the orientation of the respective analyzer of each detector.

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Rehovot, Israel

Adam Baer