Leica Camera Ag

Carl Zeiss Smt Gmbh

Achim Zirkel

Jakob Bleicher

Toralf Gruner

Heiko Feldmann

Daniel Kraehmer

Alexandra Pazidis

Vladimir Kamenov

Stephan Six

Karl-Stefan Weissenrieder

Bruno Thome

Marcus Deschauer

Stephan Albrecht

Alexandra Bleicher

The present invention relates to an objective for photographic applications, comprising, in a sequence from an object side end to an image side end, a first lens group having a positive refractivity with at least one lens, a second lens group having a negative refractivity with a single lens, a third lens group having a negative refractivity with a single lens and a fourth lens group having a positive refractivity with at least one lens, wherein the lenses of the second and third lens groups each have a concave surface which face one another and define an air lens, wherein f1 is the overall focal length of the lenses of the second and third lens groups and f2 is the focal length of the air lens, and wherein the relationship 5.0&#x2264;f1/f2&#x2264;9.0 is true.

Photographic objective

The present invention relates to an optical lens system for a camera comprising in an order from an end at the object side to an end at the image side a first lens having a positive refractive power, a second lens having a positive refractive power, a third lens having a positive refractive power, and a fourth lens having a negative refractive power, wherein the second and third lenses are each designed as meniscus lenses, wherein the surface of the second lens at the object side is convex and the surface of the third lens at the object side is concave. The invention further relates to an imaging system having an image sensor that has a plurality of light-sensitive elements arranged in rows and columns and having such an optical lens system.

Optical lens system and imaging system

The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.

Microlithographic projection exposure apparatus

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Munich, Germany

Achim Zirkel