Koninklijke Philips Corporation N.V.

Ushio Denki Kabushiki Kaisha

Xtreme Technologies Gmbh

Radex-heraklith Industriebeteiligungs Aktiengesellschaft

Koninklijke Philips Electronics N.v.

Philips Intellectual Property & Standards Gmbh

Achim Weber

Christof Metzmacher

Guenther Hans Derra

Peter Zink

Thomas Kruecken

Tatsushi Igarashi

Hironobu Yabuta

Hiroto Sato

Rolf Theo Anton Apetz

Noritaka Ashizawa

Joseph Robert Rene Pankert

Gunnar Kloss

Hermann Giese

Bernd Epstein

Disclosed herein a rotational type foil trap that is capable of avoiding the transmission rate of the EUV light to be lowered even when the EUV light source operates with the high input power and also suppressing the temperature increase of the foil to attain a sufficient life duration. In the rotational type foil trap, one end of each of foils is inserted into each of a plurality of grooves provided on a side face of a center support, and the center support and the each of the foils are fixed together by brazing.

Foil trap and light source device using such foil trap

A method of cleaning at least one optical component of at least one irradiation device having at least one radiation source in a vacuum chamber. The source generates in particular extreme ultraviolet and/or soft X-ray radiation whose rays are guided via the optical component onto a workpiece to be treated, during which the optical component is at least partly polluted because of an inorganic substance introduced by the radiation source. A least one reaction partner that is substantially translucent or transparent to the rays is introduced via a feeder device in dependence on the prevailing reaction conditions. The reaction partner reacts chemically with the polluting deposits so as to remove them from the optical component.

Method and device for cleaning at least one optical component

The invention relates to an improved EUV generating device having a contamination captor for 'catching' contamination and/or debris caused by corrosion or otherwise unwanted reactions of the tin bath.

Extreme UV radiation generating device comprising a contamination captor

The invention relates to an improved EUV generating device having coated supply pipes for the liquid tin, in order to provide an extreme UV radiation generating device which is capable of providing a less contaminated flow of tin to and from a plasma generating part.

Extreme UV radiation generating device comprising a corrosion-resistant material

The present invention relates to a method of cleaning and after treatment of optical surfaces in an irradiation unit, said irradiation unit comprising a radiation source () emitting EUV-radiation and/or soft X-rays, a first volume () following said radiation source () and containing first optical components () with said optical surfaces, and a second volume () following said first volume () and containing second optical components (). The method comprises at least one cleaning step in which a first gas or gas mixture is brought into contact with said optical surfaces, thereby forming volatile compounds with contaminations deposited on said optical surfaces, wherein said compounds are pumped out of the first volume () together with the first gas or gas mixture. In an after treatment step following said cleaning step the radiation source () is operated once or several times in order to release residues of the cleaning step from the optical surfaces by irradiating said optical surfaces with said EUV-radiation or soft X-rays while the first volume () is separated from the second volume (), wherein said released residues are pumped out of the first volume (). With this method an improved cleaning result is achieved.

Method of cleaning and after treatment of optical surfaces in an irradiation unit

The present invention provides a method of cleaning optical surfaces in an irradiation unit in order to remove contaminations deposited on said optical surfaces. The method includes a cleaning step in which a first gas or gas mixture is brought into contact with said optical surfaces thereby forming a volatile compound with a first portion of said contaminations. In an operation pause of the irradiation unit prior to the cleaning step, a pretreatment step is performed, in which a second gas or gas mixture is brought into contact with said optical surfaces. Said second gas or gas mixture is selected to react with a second portion of said contaminations different from said first portion to form a reaction product, which is able to form a volatile compound with said first gas or gas mixture.

Method of cleaning optical surfaces of an irradiation unit in a two-step process

The present invention relates to a method of cleaning a surface at least partly covered with contaminant or undesired material by applying atomic hydrogen. The invention also proposes an irradiation unit adapted to perform the cleaning method. In the present method the atomic hydrogen is generated by dissociation of molecular hydrogen directed to a surface containing catalytic material, which causes the dissociation of at least a part of the molecular hydrogen to atomic hydrogen. The surface with the catalytic material is arranged close to the surface to be cleaned and is dimensioned such that its total surface area is at least twice the surface area of the to be cleaned surface region. The method allows for the cleaning of the surface region in a constructive simple and efficient manner.

Method of cleaning a surface region covered with contaminant or undesirable material

The present invention pertains to a process for preparing a benzo(a)pyrene-free, carbon-containing, refractory ceramic material that can subsequently be used for preparing ceramic preforms.

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Aachen, Germany

Achim Weber