Intel Corporation

Abhishek Anil Sharma

Van H Le

Wilfred Gomes

Travis W LaJoie

Yu-Wen Huang

Tahir Ghani

Anand S Murthy

Rishabh Mehandru

Bernhard Sell

Allen B Gardiner

Shu Zhou

Rajabali Koduri

Jared Stoeger

Sagar Suthram

Xiaojun Weng

Moshe Dolejsi

Juan Alzate Vinasco

Cheng Tan

Hui-Min Chuang

Techniques are provided herein for forming transistor devices with reduced parasitic capacitance, such as transistors used in a memory structure. In an example, a given memory structure includes memory cells, with a given memory cell having an access device and a storage device. The access device may include, for example, a thin film transistor (TFT), and the storage device may include a capacitor. Any of the given TFTs may include a dielectric liner extending along sidewalls of the TFT. The TFT includes a recess (e.g., a dimple) that extends laterally inwards toward a midpoint of a semiconductor region of the TFT. The dielectric liner thus also pinches or otherwise extends inward. This pinched-in dielectric liner may reduce parasitic capacitance between the contacts of the TFT and the gate electrode of the TFT. The pinched-in dielectric liner may also protect the contacts from forming too deep into the semiconductor region.

Dielectric sidewall features for tuning thin film transistor (TFT) parasitics

Methods and apparatus to implement an integrated circuit to operate based on data access characteristics. For example, the integrated circuit comprises a first array comprising a first plurality of memory cells, a second array comprising a second plurality of memory cells, and both first and second arrays to store data of a processor. The second plurality of memory cells implements a selector transistor of a memory cell within using a thin-film transistor (TFT), and a memory control circuit is to write a first set of bits to the first array and a second set of bits to the second array upon determining the first set of bits is to be accessed more frequently than the second set of bits.

Embedded dynamic random-access memory (eDRAM) to operate based on data access characteristics

An integrated circuit (IC) includes a first memory cell and a second memory cell. The first memory cell includes (i) a first transistor and (ii) a first capacitor coupled to the first transistor, where an upper electrode of the first capacitor is coupled to a first conductive structure. The second memory cell is above the first memory cell. The second memory cell includes (i) a second transistor and (ii) a second capacitor coupled to the second transistor. An upper electrode of the second capacitor is coupled to a second conductive structure. In an example, an interconnect feature includes a continuous and monolithic body of conductive material. In an example, the continuous and monolithic body extends through the second conductive structure, and further extends through the first conductive structure. In an example, the first and second memory cells are dynamic random access memory (DRAM) memory cells.

Punch-through interconnect feature to couple upper electrodes of capacitors of multi-level memory arrays

Structures having ultra-high conductivity global routing are described. In an example, an integrated circuit structure includes a device layer having a plurality of transistors. A plurality of metallization layers is above the plurality of transistors of the device layer. One or more of the metal layers includes a material having a critical temperature greater than 10 Kelvin and less than 300 Kelvin.

Integrated circuit structures having ultra-high conductivity global routing

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Portland, OR, United States of America

Abhishek Anil Sharma