Applied Materials, Inc.

Abdullah Zafar

Philip Allan Kraus

Kelvin Chan

David J Coumou

Adolph Miller Allen

Kenric T Choi

Amir Bayati

Farzad Houshmand

William John Durand

Michelle SanPedro

Xinyuan Chong

Weize Hu

Usman Chowdhury

Kasturi Sarang

Vapor concentration sensors for deposition process or deposition chamber condition monitoring are described. In an example, a deposition system includes a deposition chamber, a deposition precursor source coupled to an inlet of the deposition chamber, and a non-dispersive infrared (NDIR) vapor concentration sensor between the deposition precursor source and the deposition chamber.

Vapor concentration sensors for process chambers

Embodiments disclosed herein include semiconductor processing tools. In an embodiment, the semiconductor processing tool comprises a plasma source, and a chamber coupled to the plasma source. In an embodiment, a pump is coupled to the chamber. In an embodiment, the semiconductor processing tool further comprises a sampling line. In an embodiment, the sampling line comprises a reaction chamber, and an absorption chamber.

Reaction cell for species sensing

Methods and apparatus for processing a substrate are provided herein. For example, a gas supply configured for use with a processing chamber includes an ampoule that stores a precursor and comprises an input to receive a carrier gas and an output to provide a mixture of the carrier gas and the precursor to the processing chamber and a sensor assembly comprising a detector and an infrared source operably connected to an outside of an enclosure, through which the mixture flows, and a gas measurement volume disposed within the enclosure and along an inner wall thereof so that a concentration of the precursor in the mixture can be measured by the detector and transmitted to a controller.

Methods and apparatus for processing a substrate

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Santa Clara, CA, United States of America

Abdullah Zafar