Globalfoundries Inc.

Abbas Guvenilir

Jason Eugene Stephens

David C Pritchard

David E Brown

Vikrant Kumar Chauhan

Ahmed Hassan

Nader Magdy Hindawy

Terry J Bordelon

One illustrative method disclosed herein involves, among other things, decomposing an initial circuit layout into first and second mask patterns, for the first mask pattern, identifying a first four-polygon pattern in the first mask pattern that violates a multi-polygon constraint rule, wherein the first four-polygon pattern comprises four polygons positioned side-by-side in the first mask pattern, and recoloring one or two of the polygons in the first four-polygon pattern in the first mask pattern to the second mask pattern to eliminate the first four-polygon pattern from the first mask pattern without introducing any design rule violations in the initial circuit layout.

Multi-polygon constraint decomposition techniques for use in double patterning applications

Growing community of inventors

Gansevoort, NY, United States of America

Abbas Guvenilir