Asml Netherlands B.v.

Carl-Zeiss-Smt Ag

Aart Adrianus Van Beuzekom

Bernardus Antonius Johannes Luttikhuis

Johannes Martinus Andreas Hazenberg

Paul Van Dongen

Harmen Klaas Van Der Schoot

Cornelius Maria Rops

Hernes Jacobs

Ronald Van Der Ham

Gerben Pieterse

Petrus Matthijs Henricus Vosters

Ruud Olieslagers

Hubert Marie Segers

Jozef Augustinus Maria Alberti

Pepijn Van Den Eijnden

Francis Fahrni

Bas Willems

Erik Roelof Loopstra

Bernhard Geuppert

Franz Sorg

Laurentius Catrinus Jorritsma

Adrianus Franciscus Petrus Engelen

Johannes Wilhelmus De Klerk

Peter Deufel

Maria Johanna Agnes Rubingh

Peter Schaap

Petrus Franciscus Wilhelmus Maria Mandigers

A lithographic apparatus comprising a substrate storage module having a controllable environment for protecting lithographically exposed substrates from ambient air. The substrate storage module is configured to store at least twenty substrates and the substrate storage module is an integral part of the lithographic apparatus. The substrate storage module may be used to protect substrates from ambient air during stitched lithographic exposures.

Lithographic apparatus and method

A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

Lithographic apparatus, method of transferring a substrate and device manufacturing method

An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The array of diodes can be configured to provide a patterned radiation beam, where the projection system projects the patterned radiation beam onto a target portion of a conditioned substrate.

Substrate handler, lithographic apparatus and device manufacturing method

A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.

Lithographic apparatus, device manufacturing method and exchangeable optical element

Embodiments of the invention relates to a substrate handler for handling a substrate, including a conditioning device for conditioning the substrate. In an embodiment, the substrate handler includes a displacing device configured to displace the substrate in a direction substantially parallel to the support surface, wherein the displacing device is configured to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. According to another embodiment of the invention, the substrate handler includes a float device for providing an air bed above a support surface of the substrate handler, the substrate handler being configured to support the substrate on an air bed during conditioning of the substrate.

Growing community of inventors

Eindhoven, Netherlands

Aart Adrianus Van Beuzekom