Mks Instruments, Inc.

Eni Technology, Inc.

Mks Inc.

Lam Research Corporation

Aaron T Radomski

Larry J Fisk, Ii

Jonathan W Smyka

Aaron Michael Burry

Mariusz Oldziej

Ky Thoai Luu

Peter Paul

David J Coumou

Ross Reinhardt

Kevin P Nasman

Duy Nguyen

Jesse N Klein

Yogendra K Chawla

Amish Rughoonundon

William R Pulhamus, Jr

Matthew G Harrington

Benjamin J Gitlin

John Patrick Holland

Alexei Marakhtanov

Felix Leib Kozakevich

Jin Huh

Ranadeep Bhowmick

Bing Ji

Daniel J Lincoln

Dennis M Brown

Salvatore Polizzo

Daniel J Vona, Jr

John Valcore, Jr

Yufeng Han

Soohan Kim

Albert Kuramshin

Alexander Jurkov

Hangon Kim

Kelvin Lee

David Miller

Dave Coffta

Linnell Martinez

Sang-Won Lee

Vadim Lubomirsky

Sang Won Lee

Richard Pham

Anthony R A Keane

Eldridge M Mount, Iv

Jaehyun Kim

Aung Toe

Nicholas Nelson

Craig A Covert

Scott R Bullock

Brent Irvine

Paul Eyerman

Carl Ioriatti

William Stenglein

Michael Kirk

Aaron Burry

Jonathon W Smyka

Larry J Fisk Ii

Larry J Ii Fisk

Ii Larry J Fisk

Jon Smyka

A RF power generation system includes a power source configured to generate a periodic waveform applied to a load and a controller configured to receive at least one of a voltage signal or a current signal indicating a respective voltage and current applied to an electrode of the load. The controller determines a surface potential of a workpiece in the load in accordance with the at least one of the voltage signal or the current signal and a series capacitance of the electrode. The controller further determines an ion potential in accordance with an approximation of the surface potential. The periodic waveform may be one of a pulsed DC waveform, a RF waveform, or a pulsed RF waveform.

Non-invasive IED estimation for pulsed-DC and low frequency applications

A power generator includes a power source and a control module coupled to the power source. The control module is configured to generate at least one control signal to vary a respective at least one of an output signal from the power source or an impedance between the power source and a load. The output signal includes a signal modulated by a pulse signal, and the control module is further configured to adjust the at least one control signal to vary at least one of an amplitude or a frequency of the output signal or the impedance between the power source and the load to control a shape of the pulse signal. The at least one of the amplitude, the frequency, or the impedance is adjusted in accordance with respective feedforward adjustments that vary in accordance with a respective sensed pulse parameter detected between a matching network and the load.

Adaptive pulse shaping with post match sensor

A radio frequency (RF) power generation system includes a RF power source that generates a RF output signal delivered to a load. A RF power controller is configured to generate a control signal to vary the RF output signal. The controller adjusts a parameter associated with the RF output signal, and the parameter is controlled in accordance with a trigger signal. The parameter is adjusted over a predetermined number of bins. The parameter is adjusted in accordance with a cost function, and the cost function is determined by introducing a perturbation for each bin into an actuator that affects the cost function. The actuator may control an external RF output signal, and the trigger signal may vary in accordance with the external RF output signal. The perturbation is determined in accordance with a basis set having fewer dimensions than the number of bins.

Enhanced tuning methods for mitigating RF load impedance variations due to periodic disturbances

A radio frequency (RF) power generation system includes a RF power source that generates a RF output signal delivered to a load. A RF power controller is configured to generate a control signal to vary the RF output signal. The controller adjusts a parameter associated with the RF output signal, and the parameter is controlled in accordance with a trigger signal. The parameter is adjusted in accordance with a cost function, and the cost function is determined by intruding a perturbation into an actuator that affects the cost function. The actuator may control an external RF output signal, and the trigger signal may vary in accordance with the external RF output signal.

Apparatus and tuning method for mitigating RF load impedance variations due to periodic disturbances

A radio frequency (RF) generator includes a RF power source configured to output an RF power signal, and a controller coupled to the RF power source. The controller is configured to generate a pulse to modulate the RF power signal of the RF power source. The pulse includes one or more state transitions. The controller is further configured to receive a sync signal indicative of one or more operating characteristics or parameters of another RF generator, and adjust at least one of the state transitions of the pulse to synchronize the state transition with a defined phase of the received sync signal. Other example RF generators, RF power delivery systems including one or more RF generators, and control methods for adjusting a state transition of a pulse to synchronize the state transition with a defined phase of a sync signal are also disclosed.

Pulse and bias synchronization methods and systems

A switched capacitor modulator (SCM) includes a RF power amplifier. The RF power amplifier receives a rectified voltage and a RF drive signal and modulates an input signal in accordance with the rectified voltage to generate a RF output signal to an output terminal. A reactance in parallel with the output terminal is configured to vary in response to a control signal to vary an equivalent reactance in parallel with the output terminal. A controller generates the control signal and a commanded phase. The commanded phase controls the RF drive signal. The reactance is at least one of a capacitance or an inductance, and the capacitance or the inductance varies in accordance with the control signal.

Switched capacitor modulator

A controller for a plasma generation system includes a model evaluation module receives a sensed value that varies in accordance with a state of a plasma controlled by a RF power generator. The model evaluation module generates a plasma parameter that varies in accordance with the sensed value. A model integration module receives the plasma parameter, integrates the plasma parameter, and outputs an integrated model parameter. An IEDF evaluation module receives the integrated model parameter and generates an ion energy distribution function (IEDF) in accordance with the integrated model parameter. An IEDF controller module receives the IEDF and generates a signal for controlling a RF generator. A RF generator control module receives the signal and generates an RF generator control signal to control at least one of power, frequency, or phase of the RF power generator.

Real-time, non-invasive IEDF plasma sensor

A radio frequency (RF) generator system includes first and second RF power sources, each RF power source applying a respective RF signal and second RF signal to a load. The first RF signal is applied in accordance with the application of the second RF signal. The application of the first RF signal is synchronized to application of the second RF signal. The first RF signal may be amplitude modulated in synchronization with the second RF signal, and the amplitude modulation can include blanking of the first RF signal. A frequency offset may be applied to the first RF signal in synchronization with the second RF signal. A variable actuator associated with the first RF power source may be controlled in accordance with the second RF signal.

High speed synchronization of plasma source/bias power delivery

A matching network for a system having a non-linear load and powered by a first RF power supply operating at a first frequency and a second RF power supply operating at a second frequency. The matching network includes a first matching network section for providing an impedance match between the first power supply and the load. The matching network also includes a second matching network section for providing an impedance match between the second power supply and the load. The first matching network section includes a first variable reactance, and the variable reactance is controlled in accordance with IMD sensed in the signal applied to the load by the first RF power supply. The variable reactance is adjusted in accordance with the IMD to reduce the detected IMD.

Intermodulation distortion mitigation using electronic variable capacitor

A RF generator includes a RF power source and a RF control module coupled to the RF power source. The RF control module is configured to generate at least one control signal to vary a respective at least one of an RF output signal from the RF power source or an impedance between the RF power source and a load. The RF output signal includes a RF signal modulated by a pulse signal, and the RF control module is further configured to adjust the at least one control signal to vary at least one of an amplitude or a frequency of the RF output signal or the impedance between the RF power source and the load to control a shape of the pulse signal. The at least one of the amplitude, the frequency, or the impedance is adjusted in accordance with respective feedforward adjustments that vary in accordance with a respective sensed pulse parameter detected between a matching network and the load.

An arc detector for a RF power supply system, where the RF power supply incudes a first RF power supply and a second RF power supply. A signal applied to a non-linear load varies in accordance with an output from one of the first RF power supply or the second RF power supply. The signal has a frequency. During an arc or arc condition in the non-linear load, the frequency of the signal changes, and if the frequency is outside of a selected range, an arc or arc condition is indicated. The frequency can be determined by digitizing the signal into a series of pulses and measuring a time or period between pulses.

System and method for arc detection using a bias RF generator signal

A clamp configured to be coupled to a printed circuit board to cool and compress one or more electrical connections subject to repeated power and thermal cycling. A first conductive column of the clamp is configured to compress a first electrical connection between a first power device lead and a first printed circuit board trace of the printed circuit board, and draw thermal energy away from the first power device lead. The first conductive column extends from a load spreading plate. The load spreading plate is an insulator that electrically isolates a fastener extending therefrom from the first conductive column. The fastener is configured to cooperate with the circuit board to connect the clamp to the circuit board, compress the load spreading plate against the first conductive column to compress the first electrical connection, and connect the clamp to ground.

Cooling and compression clamp for short lead power devices

A repeating setpoint generator module selectively varies a setpoint for an output parameter according to a predetermined pattern that repeats during successive time intervals. A closed-loop module, during a first one of the time intervals, generates N closed-loop values based on N differences between (i) N values of the setpoint at N times during the first one of the time intervals and (ii) N measurements of the output parameter at the N times during the first one of the time intervals, respectively. An adjusting module, during the first one of the time intervals, generates N adjustment values based on N differences between (i) N values of the setpoint at the N times during a second one of the time intervals and (ii) N measurements of the output parameter at the N times during the second one of the time intervals, respectively.

Adaptive periodic waveform controller

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Conesus, NY, United States of America

Aaron T Radomski