Applied Materials, Inc.

Facebook, Inc.

Meta Platforms, Inc.

Aaron Jacob Miller

Norman L Tam

Michael Liu

Joseph Michael Ranish

Stephen Moffatt

Kallol Bera

Mehmet Tugrul Samir

Shu-Kwan Danny Lau

Oleg V Serebryanov

Leonid Mark Tertitski

Kim Ramkumar Vellore

Manish Modi

Dinesh Kanawade

Sarah E Hanna

Shlomo Priymak

Colin Fox

Zhefu Jiang

Greg Epstein

Lara Hawrylchak

Mehran Behdjat

Kong Lung Samuel Chan

In an embodiment, a power management system includes a detection unit configured to detect a power interruption to a power supply. The system further includes a communication interface configured to, in response to the detected power interruption, provide a message regarding the detected power interruption. In response to the detected power interruption, a computer network switch provides notifications to a plurality of servers connected to the switch to allow the plurality of servers to prepare for a loss in power.

Power loss siren

Apparatus and methods for processing a substrate including an injector unit insert with a plurality of flow paths leading to a first plenum, each of the flow paths providing one or more of substantially the same residence time, length and/or conductance. Injector units including the injector unit inserts have increased flow uniformity.

Recursive inject apparatus for improved distribution of gas

Embodiments disclosed herein describe a liner assembly including a plurality of individually separated gas passages. The liner assembly provides control of flow parameters, such as velocity, density, direction and spatial location, across a substrate being processed. The processing gas across the substrate being processed may be specially tailored for individual processes with a liner assembly according to the present embodiments.

Liner for epi chamber

Implementations of the present disclosure provide an adapter for use in a processing chamber. In one implementation, the adapter comprises a hollow body having a first end and a second end opposing the first end, a first block and a second block symmetrically disposed within the hollow body about a longitudinal axis of the body, wherein the first block and the second block define a central opening therebetween, and a retention device disposed in contact with the first and second blocks to confine the movement of the first and second blocks with respect to the hollow body. The central opening is sized so that the first block and the second block provide direct contact with a press seal of the lamp.

Lamp base adapter design for baseless lamps

Embodiments of the present invention provide a liner assembly including an inject insert. The inject insert enables tenability of flow parameters, such as velocity, density, direction and spatial location, across a substrate being processed. The processing gas across the substrate being processed may be specially tailored for individual processes with a liner assembly according to embodiment of the present invention.

Inject insert for EPI chamber

Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.

Visual feedback for process control in RTP chambers

Showerhead for a semiconductor processing chamber

Embodiments of the present disclosure provide a cover assembly that includes a cover disposed between a device side surface of a substrate and a reflector plate, which are disposed within a thermal processing chamber. The presence of the cover between the device side surface of a substrate and a reflector plate has many advantages over conventional thermal processing chamber designs, which include an improved temperature uniformity during processing, a reduced chamber down time and an improved cost-of-ownership of the processes performed in the thermal processing chamber. In some configurations, the cover includes two or more ports that are formed therein and are positioned to deliver a gas, from a space formed between the reflector plate and the cover, to desired regions of the substrate during processing to reduce the temperature variation across the substrate.

Apparatus for reducing the effect of contamination on a rapid thermal process

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Sunnyvale, CA, United States of America

Aaron Jacob Miller