Asml Holding N.v.

Asml Netherlands B.v.

Aage Bendiksen

Marcus Adrianus Van De Kerkhof

Derk Servatius Gertruda Brouns

Johannes Petrus Martinus Bernardus Vermeulen

Paul Janssen

Pieter-Jan Van Zwol

Mária Péter

David Ferdinand Vles

James Norman Wiley

Arnoud Willem Notenboom

Pradeep Kumar Govil

Maxim Aleksandrovich Nasalevich

Willem Joan Van Der Zande

Willem-Pieter Voorthuijzen

Erik Achilles Abegg

Michal Emanuel Pawlowski

Andrew Judge

Christopher Michael Dohan

Justin Lloyd Kreuzer

Johannes Onvlee

Theodorus Marinus Modderman

Han-Kwang Nienhuys

Peter Conrad Kochersperger

Joseph Harry Lyons

Roberto B Wiener

James Hamilton Walsh

Manish Ranjan

Joshua Adams

Arun Mahadevan Venkataraman

Richard Jacobs

Kirill Urievich Sobolev

Pedro Julian Rizo Diago

Veera Venkata Narasimha Narendra Phani Kottapalli

Xugang Xiong

Ryan Alan Munden

Mária PÉTER

An inspection system, a lithography apparatus, and an inspection method are provided. The inspection system includes an illumination system, a detection system, and processing circuitry. The illumination system generates a broadband beam and illuminates surface of an object with the broadband illumination beam. The broadband beam has a continuous spectral range. The detection system receives radiation scattered at the surface and by a structure near the surface. The detection system generates a detection signal based on an optical response to the broadband illumination beam. The processing circuitry analyzes the detection signal. The processing circuitry distinguishes between a spurious signal and a signal corresponding to a defect on the surface based on the analyzing. The spurious signal is diminished for at least a portion of the continuous spectral range.

Contaminant analyzing metrology system, lithographic apparatus, and methods thereof

An inspection system includes a radiation source that generates a beam of radiation and irradiates a first surface of an object, defining a region of the first surface of the object. The radiation source also irradiates a second surface of the object, defining a region of the second surface, wherein the second surface is at a different depth level within the object than the first surface. The inspection system may also include a detector that defines a field of view (FOV) of the first surface including the region of the first surface, and receives radiation scattered from the region of the first surface and the region of the second surface. The inspection system may also include a processor that discards image data not received from the region of the first surface, and constructs a composite image comprising the image data from across the region of the first surface.

Method for region of interest processing for reticle particle detection

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

Pellicle and pellicle assembly

An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.

Apparatus and method for determining a condition associated with a pellicle

A system () includes an illumination system (), a detector (), and a comparator (). The illumination system includes a radiation source () and a spatial light modulator (). The radiation source generates a beam of radiation (). The spatial light modulator directs the beam toward a surface () of an object () and adjusts a spatial intensity distribution of the beam at the surface. The detector receives radiation () scattered at the surface and by a structure () near the surface. The detector generates a detection signal based on the received radiation. The comparator receives the detection signal, generates a first image based on the detection signal, and distinguishes between a spurious signal and a signal corresponding to a presence of a foreign particle on the surface based on the first image and the adjusted spatial intensity distribution.

Contaminant detection metrology system, lithographic apparatus, and methods thereof

A system designed to couple a patterning device to a support structure having a plurality of burls includes a camera module, an actuator, and a controller. The camera module is designed to capture image data of a backside of the patterning device. The actuator is coupled to at least one burl of the plurality of burls and is designed to move the at least one burl. The controller is designed to receive the image data captured from the camera module and determine one or more locations of contamination on the backside of the patterning device from the image data. The controller is also designed to control the actuator to move the at least one burl of the plurality of burls away from the one or more locations of contamination on the backside of the patterning device, based on the determined locations of contamination.

Control of reticle placement for defectivity optimization

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.

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Fairfield, CT, United States of America

Aage Bendiksen