Osamu Matsumoto

Title: Osamu Matsumoto: Innovator in Plasma Technology

Introduction

Osamu Matsumoto is a distinguished inventor based in Akishima, Japan. He has made significant contributions to the field of plasma technology, holding a total of 2 patents. His innovative work focuses on dry process systems and etching processes that enhance manufacturing efficiency.

Latest Patents

Matsumoto's latest patents include a "Dry Process System" and a "Continuous Etching Process and Apparatus Therefor." The dry process system features a chamber with an inlet for reaction gas and an exhaust port for exhaust gas. It utilizes at least one pair of electrodes connected to an alternating current power source through a blocking capacitor. This design allows for the generation of a magnetic field nearly parallel to the surface of each electrode, facilitating the formation of a nearly uniform plasma without the need for a rotating magnetic field. The continuous etching process involves forming multiple resist membranes on a substrate, followed by a series of steps to dry-etch the multilayer resists and treat them with plasma.

Career Highlights

Osamu Matsumoto is currently employed at Kokusai Electric Co., Ltd., where he continues to develop innovative technologies in plasma processing. His work has significantly impacted the semiconductor manufacturing industry, providing solutions that improve the precision and efficiency of etching processes.

Collaborations

Matsumoto has collaborated with notable colleagues, including Haruhisa Kinoshita and Harunobu Sakuma. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Osamu Matsumoto's contributions to plasma technology through his patents and career at Kokusai Electric Co., Ltd. highlight his role as a key innovator in the field. His work continues to influence advancements in manufacturing processes, showcasing the importance of innovation in technology.