Fukuyama, Japan

Norihisa Fujii


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Osaka, JP (2016)
  • Fukuyama, JP (2019)

Company Filing History:


Years Active: 2016-2019

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2 patents (USPTO):Explore Patents

Title: Norihisa Fujii: Innovator in Semiconductor Technology

Introduction

Norihisa Fujii is a prominent inventor based in Fukuyama, Japan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to solving complex engineering challenges.

Latest Patents

Fujii's latest patents include a nitride semiconductor device and a heterojunction field effect transistor. The nitride semiconductor device features a second insulating film that covers at least a drain electrode and incorporates a thermal stress reducer. This reducer minimizes thermal stress generated between the drain electrode and the second insulating film during load shorts. The thermal stress reducer is designed as a drain field plate portion, extending from the upper part of the drain electrode toward the source electrode.

The heterojunction field effect transistor includes a first contact portion and a second contact portion. Notably, the length of the first contact portion is shorter than that of the source electrodes, while the second contact portion is shorter than the drain electrodes. This design ensures that the distance from the ends of the second contact portion to the ends of the drain electrode is greater than the distance from the ends of the first contact portion to the ends of the source electrode.

Career Highlights

Fujii is associated with Sharp Kabushiki Kaisha Corporation, where he has been instrumental in advancing semiconductor technologies. His work has contributed to the development of more efficient and reliable electronic components.

Collaborations

Fujii has collaborated with notable colleagues, including Masaru Kubo and Hisao Ichijoh. Their combined expertise has fostered innovation and progress in their respective fields.

Conclusion

Norihisa Fujii's contributions to semiconductor technology through his patents reflect his dedication to innovation and engineering excellence. His work continues to influence the industry and pave the way for future advancements.

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