Min Sung Jeon

Title: Min Sung Jeon: Innovator in Substrate Processing Technology

Introduction

Min Sung Jeon is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate processing, particularly in the area of atomic layer etching. His innovative approach aims to enhance the stability and efficiency of substrate processing methods.

Latest Patents

Min Sung Jeon holds a patent for an "Apparatus and method for processing substrate." This patent describes a substrate processing method capable of stably performing atomic layer etching without damaging a process chamber. The method involves providing a substrate that includes a target layer in a chamber, forming a first plasma using a first gas containing chlorine to reform the target layer, and forming a second plasma using a second gas containing oxygen to further reform the target layer. The process includes providing a precursor to react with the second reformed target layer and removing portions of the target layer through repeated cycles of plasma formation and precursor application. He has 1 patent to his name.

Career Highlights

Min Sung Jeon is currently employed at Semes Co., Ltd., where he continues to develop innovative technologies in substrate processing. His work has been instrumental in advancing the capabilities of atomic layer etching, which is crucial for various applications in semiconductor manufacturing.

Collaborations

Min Sung Jeon collaborates with talented individuals in his field, including Young Eun Jeon and Yun Sang Kim. Their combined expertise contributes to the ongoing development of cutting-edge technologies in substrate processing.

Conclusion

Min Sung Jeon is a prominent figure in the field of substrate processing, with a focus on improving atomic layer etching techniques. His innovative patent and collaborative efforts highlight his commitment to advancing technology in this critical area.