Masanori Kojima

Title: The Innovations of Masanori Kojima

Introduction

Masanori Kojima is a prominent inventor based in Fussa, Japan, known for his significant contributions to semiconductor technology. With a total of 12 patents to his name, Kojima has made remarkable advancements in the field, particularly in the fabrication of semiconductor devices.

Latest Patents

Kojima's latest patents focus on innovative methods for fabricating semiconductor devices. One notable patent describes a method where the implantation step of a dopant ion for forming source and drain regions is divided into two distinct implantations. The first implantation is for forming a p/n junction with a well region, while the second implantation involves a dopant ion that does not affect the position of the p/n junction. This second implantation is characterized by a shallow depth and a large amount of dopant. Following an activation heat treatment, the surface of the source/drain region is transformed into cobalt silicide, resulting in low resistance and reduced p/n junction leakage.

Career Highlights

Throughout his career, Kojima has worked with notable companies in the semiconductor industry, including Renesas Technology Corporation and Hitachi ULSI Systems Co., Ltd. His experience in these organizations has allowed him to refine his expertise and contribute to groundbreaking innovations in semiconductor technology.

Collaborations

Kojima has collaborated with esteemed colleagues such as Shinichi Fukada and Naotaka Hashimoto. These partnerships have fostered a collaborative environment that has led to significant advancements in their respective fields.

Conclusion

Masanori Kojima's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance as an inventor. His work continues to influence the industry and pave the way for future advancements in semiconductor fabrication.