Mao-Lin Liu

Title: Innovations by Mao-Lin Liu

Introduction

Mao-Lin Liu is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of wafer processing, holding a total of 2 patents. His work focuses on improving the efficiency and effectiveness of substrate processing systems.

Latest Patents

Mao-Lin Liu's latest patents include a wafer processing method and a substrate processing system. The wafer processing method involves several steps, including providing a wafer, an immersion device, a carrier, and a spray device. The process entails turning the wafer from a horizontal to an upright position, immersing it in the immersion device, and then placing it on the carrier for further processing. This method allows for multiple processing steps to be performed on the same carrier, thereby accelerating the overall process. The substrate processing system consists of a substrate processing set and a substrate holding unit, designed to hold a vertical substrate securely during processing.

Career Highlights

Mao-Lin Liu is associated with Scientech Corporation, where he continues to innovate in the field of substrate processing. His work has been instrumental in advancing technologies that enhance wafer processing efficiency.

Collaborations

Mao-Lin Liu collaborates with talented coworkers, including Chuan-Chang Feng and Ting-Yu Wu, who contribute to his innovative projects.

Conclusion

Mao-Lin Liu's contributions to wafer processing technology demonstrate his commitment to innovation and efficiency in the field. His patents reflect a deep understanding of substrate processing systems and their applications.